Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law
The extension of the roadmap of shorter wavelength extreme ultraviolet and soft x-ray sources is a topic of considerable interest. We have studied the optimized emission from high power and/or high brightness sources based on unresolved transition array (UTA) emission. The peak UTA wavelengths follo...
| Main Authors: | , , , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2019-11-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5127943 |
| _version_ | 1831537233695342592 |
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| author | Yuta Shimada Hiromu Kawasaki Kanon Watanabe Hiroyuki Hara Kyoya Anraku Misaki Shoji Toru Oba Masaru Matsuda Weihua Jiang Atsushi Sunahara Masaharu Nishikino Shinichi Namba Gerry O’Sullivan Takeshi Higashiguchi |
| author_facet | Yuta Shimada Hiromu Kawasaki Kanon Watanabe Hiroyuki Hara Kyoya Anraku Misaki Shoji Toru Oba Masaru Matsuda Weihua Jiang Atsushi Sunahara Masaharu Nishikino Shinichi Namba Gerry O’Sullivan Takeshi Higashiguchi |
| author_sort | Yuta Shimada |
| collection | DOAJ |
| description | The extension of the roadmap of shorter wavelength extreme ultraviolet and soft x-ray sources is a topic of considerable interest. We have studied the optimized emission from high power and/or high brightness sources based on unresolved transition array (UTA) emission. The peak UTA wavelengths follow a quasi-Moseley’s law as λ=33.82×R∞−1(Z−20.86)−1.61 nm for the laser wavelength of 1064 nm (the critical density of 1 × 1021 cm−3) and λ=165.8×R∞−1(Z−12.44)−1.94 nm for the laser wavelength of 532 nm (the critical density of 4 × 1021 cm−3), respectively. The photon flux decreased with increasing atomic number. We also mapped the optimum electron temperatures and corresponding charge states required to produce strong soft x-ray UTA emission with a photon flux of the order of 1014 photons nm−1 sr−1. The present quasi-Moseley’s law is sufficient for identifying the optimum element for numerous applications, such as material ablation and ionization, nanolithography, and in vivo biological imaging. |
| first_indexed | 2024-12-16T23:03:17Z |
| format | Article |
| id | doaj.art-9df1cff1874842e0a6d99ecace53145d |
| institution | Directory Open Access Journal |
| issn | 2158-3226 |
| language | English |
| last_indexed | 2024-12-16T23:03:17Z |
| publishDate | 2019-11-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | AIP Advances |
| spelling | doaj.art-9df1cff1874842e0a6d99ecace53145d2022-12-21T22:12:38ZengAIP Publishing LLCAIP Advances2158-32262019-11-01911115315115315-610.1063/1.5127943Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s lawYuta Shimada0Hiromu Kawasaki1Kanon Watanabe2Hiroyuki Hara3Kyoya Anraku4Misaki Shoji5Toru Oba6Masaru Matsuda7Weihua Jiang8Atsushi Sunahara9Masaharu Nishikino10Shinichi Namba11Gerry O’Sullivan12Takeshi Higashiguchi13Department of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanDepartment of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanUtsunomiya Junior Collage Attached High School, 1-35 Mutsumi, Utsunomiya, Tochigi 320-8585 JapanDepartment of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanDepartment of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanDepartment of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanDepartment of Material and Environmental Chemistry, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanCenter for Bioscience Research and Education, Utsunomiya University, 350 Mine-machi, Utsunomiya, Tochigi 321-8505, JapanDepartment of Electrical Engineering, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, JapanCenter for Material Under Extreme Environment, Purdue University, West Lafayette, Indiana 478907, USAKansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology (QST), Kizugawa, Kyoto 619-0215, JapanGraduate School of Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, JapanSchool of Physics, University College Dublin, Belfield, Dublin 4, IrelandDepartment of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, JapanThe extension of the roadmap of shorter wavelength extreme ultraviolet and soft x-ray sources is a topic of considerable interest. We have studied the optimized emission from high power and/or high brightness sources based on unresolved transition array (UTA) emission. The peak UTA wavelengths follow a quasi-Moseley’s law as λ=33.82×R∞−1(Z−20.86)−1.61 nm for the laser wavelength of 1064 nm (the critical density of 1 × 1021 cm−3) and λ=165.8×R∞−1(Z−12.44)−1.94 nm for the laser wavelength of 532 nm (the critical density of 4 × 1021 cm−3), respectively. The photon flux decreased with increasing atomic number. We also mapped the optimum electron temperatures and corresponding charge states required to produce strong soft x-ray UTA emission with a photon flux of the order of 1014 photons nm−1 sr−1. The present quasi-Moseley’s law is sufficient for identifying the optimum element for numerous applications, such as material ablation and ionization, nanolithography, and in vivo biological imaging.http://dx.doi.org/10.1063/1.5127943 |
| spellingShingle | Yuta Shimada Hiromu Kawasaki Kanon Watanabe Hiroyuki Hara Kyoya Anraku Misaki Shoji Toru Oba Masaru Matsuda Weihua Jiang Atsushi Sunahara Masaharu Nishikino Shinichi Namba Gerry O’Sullivan Takeshi Higashiguchi Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law AIP Advances |
| title | Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law |
| title_full | Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law |
| title_fullStr | Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law |
| title_full_unstemmed | Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law |
| title_short | Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law |
| title_sort | optimized highly charged ion production for strong soft x ray sources obeying a quasi moseley s law |
| url | http://dx.doi.org/10.1063/1.5127943 |
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