Nanotip-based photoelectron microgun for ultrafast LEED

We present the design and fabrication of a micrometer-scale electron gun for the implementation of ultrafast low-energy electron diffraction from surfaces. A multi-step process involving photolithography and focused-ion-beam nanostructuring is used to assemble and elect...

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Bibliographic Details
Main Authors: Gero Storeck, Simon Vogelgesang, Murat Sivis, Sascha Schäfer, Claus Ropers
Format: Article
Language:English
Published: AIP Publishing LLC and ACA 2017-07-01
Series:Structural Dynamics
Online Access:http://dx.doi.org/10.1063/1.4982947
Description
Summary:We present the design and fabrication of a micrometer-scale electron gun for the implementation of ultrafast low-energy electron diffraction from surfaces. A multi-step process involving photolithography and focused-ion-beam nanostructuring is used to assemble and electrically contact the photoelectron gun, which consists of a nanotip photocathode in a Schottky geometry and an einzel lens for beam collimation. We characterize the low-energy electron pulses by a transient electric field effect and achieve pulse durations of 1.3 ps at an electron energy of 80 eV. First diffraction images in a backscattering geometry (at 50 eV electron energy) are shown.
ISSN:2329-7778