The Effect of Atomic Layer Deposited Overcoat on Co-Pt-Si/γ-Al<sub>2</sub>O<sub>3</sub> Fischer–Tropsch Catalyst

Atomic layer deposition (ALD) was used to prepare a thin alumina layer on Fischer–Tropsch catalysts. Co-Pt-Si/γ-Al<sub>2</sub>O<sub>3</sub> catalyst was overcoated with 15–40 cycles of Al<sub>2</sub>O<sub>3</sub> deposited from trimethylaluminum (TMA)...

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Bibliographic Details
Main Authors: Niko Heikkinen, Laura Keskiväli, Patrik Eskelinen, Matti Reinikainen, Matti Putkonen
Format: Article
Language:English
Published: MDPI AG 2021-05-01
Series:Catalysts
Subjects:
Online Access:https://www.mdpi.com/2073-4344/11/6/672
Description
Summary:Atomic layer deposition (ALD) was used to prepare a thin alumina layer on Fischer–Tropsch catalysts. Co-Pt-Si/γ-Al<sub>2</sub>O<sub>3</sub> catalyst was overcoated with 15–40 cycles of Al<sub>2</sub>O<sub>3</sub> deposited from trimethylaluminum (TMA) and water vapor, followed by thermal annealing. The resulting tailored Fischer–Tropsch catalyst with 35 cycle ALD overcoating had increased activity compared to unmodified catalyst. The increase in activity was achieved without significant loss of selectivity towards heavier hydrocarbons. Altered catalyst properties were assumed to result from cobalt particle stabilization by ALD alumina overcoating and nanoscale porosity of the overcoating. In addition to optimal thickness of the overcoat, thermal annealing was an essential part of preparing ALD overcoated catalyst.
ISSN:2073-4344