Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone

Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone

Polycrystalline SnO2 thin films were grown by atomic layer deposition (ALD) on SiO2/Si(100) substrates from SnI4 and O3. Suitable evaporation temperatures for the SnI4 precursor as well as the relationship between growth per cycle and substrate temperature were determined. Crystal growth in the film...

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Bibliographic Details
Main Authors: Kristjan Kalam, Peeter Ritslaid, Tanel Käämbre, Aile Tamm, Kaupo Kukli
Format: Article
Language:English
Published: Beilstein-Institut 2023-11-01
Series:Beilstein Journal of Nanotechnology
Subjects:
atomic layer deposition
tin oxide
tin tetraiodide
Online Access:https://doi.org/10.3762/bjnano.14.89

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