APA (7th ed.) Citation

Feng, Y., Huang, P., Zhou, Z., Ding, X., Liu, L., Liu, X., & Kang, J. (2019). Negative Differential Resistance Effect in Ru-Based RRAM Device Fabricated by Atomic Layer Deposition. SpringerOpen.

Chicago Style (17th ed.) Citation

Feng, Yulin, Peng Huang, Zheng Zhou, Xiangxiang Ding, Lifeng Liu, Xiaoyan Liu, and Jinfeng Kang. Negative Differential Resistance Effect in Ru-Based RRAM Device Fabricated by Atomic Layer Deposition. SpringerOpen, 2019.

MLA (9th ed.) Citation

Feng, Yulin, et al. Negative Differential Resistance Effect in Ru-Based RRAM Device Fabricated by Atomic Layer Deposition. SpringerOpen, 2019.