Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth
This study systematically investigated an atmospheric pressure plasma reactor with a centered single pin electrode inside a dielectric tube for depositing the polyaniline (PANI) thin film based on the experimental case studies relative to variations in pin electrode configurations (cases I, II, and...
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| Format: | Article |
| Language: | English |
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MDPI AG
2022-04-01
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| Series: | Polymers |
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| Online Access: | https://www.mdpi.com/2073-4360/14/8/1535 |
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| author | Eun Young Jung Choon-Sang Park Hyo Jun Jang Shahzad Iqbal Tae Eun Hong Bhum Jae Shin Muhan Choi Heung-Sik Tae |
| author_facet | Eun Young Jung Choon-Sang Park Hyo Jun Jang Shahzad Iqbal Tae Eun Hong Bhum Jae Shin Muhan Choi Heung-Sik Tae |
| author_sort | Eun Young Jung |
| collection | DOAJ |
| description | This study systematically investigated an atmospheric pressure plasma reactor with a centered single pin electrode inside a dielectric tube for depositing the polyaniline (PANI) thin film based on the experimental case studies relative to variations in pin electrode configurations (cases I, II, and III), bluff-body heights, and argon (Ar) gas flow rates. In these cases, the intensified charge-coupled device and optical emission spectroscopy were analyzed to investigate the factors affecting intensive glow-like plasma generation for deposition with a large area. Compared to case I, the intense glow-like plasma of the cases II and III generated abundant reactive nitrogen species (RNSs) and excited argon radical species for fragmentation and recombination of PANI. In case III, the film thickness and deposition rate of the PANI thin film were about 450 nm and 7.5 nm/min, respectively. This increase may imply that the increase in the excited radical species contributes to the fragmentation and recombination due to the increase in RNSs and excited argon radicals during the atmospheric pressure (AP) plasma polymerization to obtain the PANI thin film. This intense glow-like plasma generated broadly by the AP plasma reactor can uniformly deposit the PANI thin film, which is confirmed by field emission-scanning electron microscopy and Fourier transform infrared spectroscopy. |
| first_indexed | 2024-03-09T10:30:20Z |
| format | Article |
| id | doaj.art-a00fe0699275416085ab08cc9a3a885f |
| institution | Directory Open Access Journal |
| issn | 2073-4360 |
| language | English |
| last_indexed | 2024-03-09T10:30:20Z |
| publishDate | 2022-04-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Polymers |
| spelling | doaj.art-a00fe0699275416085ab08cc9a3a885f2023-12-01T21:20:05ZengMDPI AGPolymers2073-43602022-04-01148153510.3390/polym14081535Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film GrowthEun Young Jung0Choon-Sang Park1Hyo Jun Jang2Shahzad Iqbal3Tae Eun Hong4Bhum Jae Shin5Muhan Choi6Heung-Sik Tae7School of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, KoreaDepartment of Electrical Engineering, Milligan University, Johnson City, TN 37682, USASchool of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, KoreaSchool of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, KoreaDivision of High-Technology Materials Research, Korea Basic Science Institute, Busan 46742, KoreaDepartment of Electronics Engineering, Sejong University, Seoul 05006, KoreaSchool of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, KoreaSchool of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, KoreaThis study systematically investigated an atmospheric pressure plasma reactor with a centered single pin electrode inside a dielectric tube for depositing the polyaniline (PANI) thin film based on the experimental case studies relative to variations in pin electrode configurations (cases I, II, and III), bluff-body heights, and argon (Ar) gas flow rates. In these cases, the intensified charge-coupled device and optical emission spectroscopy were analyzed to investigate the factors affecting intensive glow-like plasma generation for deposition with a large area. Compared to case I, the intense glow-like plasma of the cases II and III generated abundant reactive nitrogen species (RNSs) and excited argon radical species for fragmentation and recombination of PANI. In case III, the film thickness and deposition rate of the PANI thin film were about 450 nm and 7.5 nm/min, respectively. This increase may imply that the increase in the excited radical species contributes to the fragmentation and recombination due to the increase in RNSs and excited argon radicals during the atmospheric pressure (AP) plasma polymerization to obtain the PANI thin film. This intense glow-like plasma generated broadly by the AP plasma reactor can uniformly deposit the PANI thin film, which is confirmed by field emission-scanning electron microscopy and Fourier transform infrared spectroscopy.https://www.mdpi.com/2073-4360/14/8/1535atmospheric pressure plasmasglow-like dischargesingle pin electrodeplasma depositionPANI thin film |
| spellingShingle | Eun Young Jung Choon-Sang Park Hyo Jun Jang Shahzad Iqbal Tae Eun Hong Bhum Jae Shin Muhan Choi Heung-Sik Tae Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth Polymers atmospheric pressure plasmas glow-like discharge single pin electrode plasma deposition PANI thin film |
| title | Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth |
| title_full | Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth |
| title_fullStr | Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth |
| title_full_unstemmed | Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth |
| title_short | Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth |
| title_sort | optimization of atmospheric pressure plasma jet with single pin electrode configuration and its application in polyaniline thin film growth |
| topic | atmospheric pressure plasmas glow-like discharge single pin electrode plasma deposition PANI thin film |
| url | https://www.mdpi.com/2073-4360/14/8/1535 |
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