OPTICAL CHARACTERISTICS OF ALN THIN FILMS DEPOSITED BY DC MAGNETRON AND ION-BEAM SPUTTERING STUDY

OPTICAL CHARACTERISTICS OF ALN THIN FILMS DEPOSITED BY DC MAGNETRON AND ION-BEAM SPUTTERING STUDY

This paper studies the optical characteristics of aluminum nitride thin films deposited by reactive magnetron and ion-beam sputtering. The dependences of the refractive index and absorption coefficient of the films on the percentage of nitrogen in the working gas mixture have been obtained. It was f...

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Bibliographic Details
Main Authors: M. V. Ermolenko, A. P. Dostanko, D. A. Golosov, S. M. Zavadskiy
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
нитрид алюминия
ионно-лучевое распыление
магнетронное распыление
коэффициент поглощения
показатель преломления
Online Access:https://doklady.bsuir.by/jour/article/view/541

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