Optimization of growth conditions of ZnO nano thin films by chemical double dip technique

Zinc oxide (ZnO) nano thin films have been deposited by the chemical double-dip technique using aqueous ZnSO4 and NaOH solutions. The ZnO films were characterized in terms of surface morphology by x-ray diffraction, energy-dispersive x-ray analysis (EDX), the use of a scanning electron microscope (S...

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Main Author: Thirukonda Anandamoorthy Vijayan et al
Format: Article
Language:English
Published: Taylor & Francis Group 2008-01-01
Series:Science and Technology of Advanced Materials
Subjects:
Online Access:http://www.iop.org/EJ/abstract/1468-6996/9/3/035007
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author Thirukonda Anandamoorthy Vijayan et al
author_facet Thirukonda Anandamoorthy Vijayan et al
author_sort Thirukonda Anandamoorthy Vijayan et al
collection DOAJ
description Zinc oxide (ZnO) nano thin films have been deposited by the chemical double-dip technique using aqueous ZnSO4 and NaOH solutions. The ZnO films were characterized in terms of surface morphology by x-ray diffraction, energy-dispersive x-ray analysis (EDX), the use of a scanning electron microscope (SEM) and atomic force microscope (AFM) for surface morphology. The films exhibited a smooth morphology. The chemical states of oxygen and zinc in the ZnO nano thin films were also investigated by x-ray photoelectron spectroscopy (XPS). In the present investigations, highly textured ZnO thin films with a preferential (002)-orientation were prepared on glass substrates. The deposition conditions were optimized to obtain device-quality films for practical applications.
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spelling doaj.art-a271ee66b4e54c3d845cc5117f8f1ed52022-12-22T02:34:12ZengTaylor & Francis GroupScience and Technology of Advanced Materials1468-69961878-55142008-01-0193035007Optimization of growth conditions of ZnO nano thin films by chemical double dip techniqueThirukonda Anandamoorthy Vijayan et alZinc oxide (ZnO) nano thin films have been deposited by the chemical double-dip technique using aqueous ZnSO4 and NaOH solutions. The ZnO films were characterized in terms of surface morphology by x-ray diffraction, energy-dispersive x-ray analysis (EDX), the use of a scanning electron microscope (SEM) and atomic force microscope (AFM) for surface morphology. The films exhibited a smooth morphology. The chemical states of oxygen and zinc in the ZnO nano thin films were also investigated by x-ray photoelectron spectroscopy (XPS). In the present investigations, highly textured ZnO thin films with a preferential (002)-orientation were prepared on glass substrates. The deposition conditions were optimized to obtain device-quality films for practical applications.http://www.iop.org/EJ/abstract/1468-6996/9/3/035007ZnOchemical depositionSEMAFMXPS
spellingShingle Thirukonda Anandamoorthy Vijayan et al
Optimization of growth conditions of ZnO nano thin films by chemical double dip technique
Science and Technology of Advanced Materials
ZnO
chemical deposition
SEM
AFM
XPS
title Optimization of growth conditions of ZnO nano thin films by chemical double dip technique
title_full Optimization of growth conditions of ZnO nano thin films by chemical double dip technique
title_fullStr Optimization of growth conditions of ZnO nano thin films by chemical double dip technique
title_full_unstemmed Optimization of growth conditions of ZnO nano thin films by chemical double dip technique
title_short Optimization of growth conditions of ZnO nano thin films by chemical double dip technique
title_sort optimization of growth conditions of zno nano thin films by chemical double dip technique
topic ZnO
chemical deposition
SEM
AFM
XPS
url http://www.iop.org/EJ/abstract/1468-6996/9/3/035007
work_keys_str_mv AT thirukondaanandamoorthyvijayanetal optimizationofgrowthconditionsofznonanothinfilmsbychemicaldoublediptechnique