Two-step Fabrication of Large Area SiO2/Si Membranes

Two-step Fabrication of Large Area SiO2/Si Membranes

Two-step fabrication technique of SiO<sub>2</sub>/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF<sub>6</sub>/O<sub>2</sub>...

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Bibliographic Details
Main Authors:	Viktoras GRIGALIŪNAS, Brigita ABAKEVIČIENĖ, Ignas GRYBAS, Angelė GUDONYTĖ, Vitoldas KOPUSTINSKAS, Darius VIRŽONIS, Ramūnas NAUJOKAITIS, Sigitas TAMULEVIČIUS
Format:	Article
Language:	English
Published:	Kaunas University of Technology 2012-12-01
Series:	Medžiagotyra
Subjects:	SiO2/Si membrane TMAH etching reactive ion etching surface roughness
Online Access:	http://matsc.ktu.lt/index.php/MatSc/article/view/3090

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