HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS

Results of hydrothermal deposition of undoped and Al doped ZnO nanocrystals on a single-crystal silicon wafers with a hydrogen passivated surface are presented. Hydrothermal deposition of undoped ZnO nanocrystals were carried-out in a equimolar solutions containing zinc nitride Zn(NO3)2 and hexameth...

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Main Author: E. B. Chubenko
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
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Online Access:https://doklady.bsuir.by/jour/article/view/159
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author E. B. Chubenko
author_facet E. B. Chubenko
author_sort E. B. Chubenko
collection DOAJ
description Results of hydrothermal deposition of undoped and Al doped ZnO nanocrystals on a single-crystal silicon wafers with a hydrogen passivated surface are presented. Hydrothermal deposition of undoped ZnO nanocrystals were carried-out in a equimolar solutions containing zinc nitride Zn(NO3)2 and hexamethylenetetramine C6H12N4. Aluminum nitride Al(NO3)3 were used as Al precursor during deposition of Al doped ZnO nanocrystals. The difference of the morphology of doped and undoped ZnO nanocrystals was shown. Photoluminescence properties of the doped and undoped ZnO nanocrystals were also studied.
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spelling doaj.art-a2e5821f294348a9a10175445f12e6b22023-03-13T07:33:10ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-01026469158HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERSE. B. Chubenko0Белорусский государственный университет информатики и радиоэлектроникиResults of hydrothermal deposition of undoped and Al doped ZnO nanocrystals on a single-crystal silicon wafers with a hydrogen passivated surface are presented. Hydrothermal deposition of undoped ZnO nanocrystals were carried-out in a equimolar solutions containing zinc nitride Zn(NO3)2 and hexamethylenetetramine C6H12N4. Aluminum nitride Al(NO3)3 were used as Al precursor during deposition of Al doped ZnO nanocrystals. The difference of the morphology of doped and undoped ZnO nanocrystals was shown. Photoluminescence properties of the doped and undoped ZnO nanocrystals were also studied.https://doklady.bsuir.by/jour/article/view/159оксид цинкакремнийнанокристаллыгидротермальное осаждениефотолюминесценция
spellingShingle E. B. Chubenko
HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
оксид цинка
кремний
нанокристаллы
гидротермальное осаждение
фотолюминесценция
title HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS
title_full HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS
title_fullStr HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS
title_full_unstemmed HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS
title_short HYDROTHERMAL DEPOSITION OF ZnO NANOSTRUCTURES ON SILICON WAFERS
title_sort hydrothermal deposition of zno nanostructures on silicon wafers
topic оксид цинка
кремний
нанокристаллы
гидротермальное осаждение
фотолюминесценция
url https://doklady.bsuir.by/jour/article/view/159
work_keys_str_mv AT ebchubenko hydrothermaldepositionofznonanostructuresonsiliconwafers