Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials
Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication proces...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
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Beilstein-Institut
2014-05-01
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| Series: | Beilstein Journal of Nanotechnology |
| Subjects: | |
| Online Access: | https://doi.org/10.3762/bjnano.5.68 |
| _version_ | 1798043151035793408 |
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| author | Jun Zhao Bettina Frank Frank Neubrech Chunjie Zhang Paul V. Braun Harald Giessen |
| author_facet | Jun Zhao Bettina Frank Frank Neubrech Chunjie Zhang Paul V. Braun Harald Giessen |
| author_sort | Jun Zhao |
| collection | DOAJ |
| description | Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV. |
| first_indexed | 2024-04-11T22:45:31Z |
| format | Article |
| id | doaj.art-a34489429aa4434d8e2f7911edf81c75 |
| institution | Directory Open Access Journal |
| issn | 2190-4286 |
| language | English |
| last_indexed | 2024-04-11T22:45:31Z |
| publishDate | 2014-05-01 |
| publisher | Beilstein-Institut |
| record_format | Article |
| series | Beilstein Journal of Nanotechnology |
| spelling | doaj.art-a34489429aa4434d8e2f7911edf81c752022-12-22T03:58:46ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862014-05-015157758610.3762/bjnano.5.682190-4286-5-68Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterialsJun Zhao0Bettina Frank1Frank Neubrech2Chunjie Zhang3Paul V. Braun4Harald Giessen54. Physics Institute and SCoPE Research Center, University of Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, Germany4. Physics Institute and SCoPE Research Center, University of Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, Germany4. Physics Institute and SCoPE Research Center, University of Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, GermanyDepartment of Materials Science and Engineering, University of Illinois at Urbana Champaign, 312E MSEB, MC-246, 1304 W. Green Street, Urbana, Illinois 61801, United StatesDepartment of Materials Science and Engineering, University of Illinois at Urbana Champaign, 312E MSEB, MC-246, 1304 W. Green Street, Urbana, Illinois 61801, United States4. Physics Institute and SCoPE Research Center, University of Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, GermanyMany nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.https://doi.org/10.3762/bjnano.5.68hole-mask colloidal nanolithographylocalized surface plasmon resonance sensinglow-cost large-area plasmonic nanostructuresmultilayer fabricationsurface-enhanced infrared absorption spectroscopy (SERS) |
| spellingShingle | Jun Zhao Bettina Frank Frank Neubrech Chunjie Zhang Paul V. Braun Harald Giessen Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials Beilstein Journal of Nanotechnology hole-mask colloidal nanolithography localized surface plasmon resonance sensing low-cost large-area plasmonic nanostructures multilayer fabrication surface-enhanced infrared absorption spectroscopy (SERS) |
| title | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_full | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_fullStr | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_full_unstemmed | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_short | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_sort | hole mask colloidal nanolithography combined with tilted angle rotation evaporation a versatile method for fabrication of low cost and large area complex plasmonic nanostructures and metamaterials |
| topic | hole-mask colloidal nanolithography localized surface plasmon resonance sensing low-cost large-area plasmonic nanostructures multilayer fabrication surface-enhanced infrared absorption spectroscopy (SERS) |
| url | https://doi.org/10.3762/bjnano.5.68 |
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