A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles

Recent advancements in two-dimensional materials have shown huge potential for optoelectronic applications. It is challenging to achieve highly effective and sensitive broadband photodetection based on MoS2 devices. Defect engineering, such as introducing vacancies, can narrow the bandgap and boost...

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Main Authors: Ran Duan, Weihong Qi, Panke Li, Kewei Tang, Guoliang Ru, Weimin Liu
Format: Article
Language:English
Published: American Association for the Advancement of Science (AAAS) 2023-01-01
Series:Research
Online Access:https://spj.science.org/doi/10.34133/research.0195
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author Ran Duan
Weihong Qi
Panke Li
Kewei Tang
Guoliang Ru
Weimin Liu
author_facet Ran Duan
Weihong Qi
Panke Li
Kewei Tang
Guoliang Ru
Weimin Liu
author_sort Ran Duan
collection DOAJ
description Recent advancements in two-dimensional materials have shown huge potential for optoelectronic applications. It is challenging to achieve highly effective and sensitive broadband photodetection based on MoS2 devices. Defect engineering, such as introducing vacancies, can narrow the bandgap and boost the separation of photogenerated carriers by defect states but leads to a slow response speed. Herein, we propose a nickel nanoparticle-induced gateless photogating effect with a unique energy band structure to enable the application of defect engineering and achieve high optoelectronic performance. The device based on Ni nanoparticle-decorated MoS2 with S vacancies exhibited high responsivities of 106.21 and 1.38 A W−1 and detectivities of 1.9 × 1012 and 8.9 × 109 Jones under 532 and 980 nm illumination (visible to near infrared), respectively, with highly accelerated response speed. This strategy provides new insight into optimizing defect engineering to design high-performance optoelectronic devices capable of broadband photodetection.
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spelling doaj.art-a386a8246ee84ba097d2bf7a4ab8a4242024-04-03T09:43:57ZengAmerican Association for the Advancement of Science (AAAS)Research2639-52742023-01-01610.34133/research.0195A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel NanoparticlesRan Duan0Weihong Qi1Panke Li2Kewei Tang3Guoliang Ru4Weimin Liu5State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an 710072, China.State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an 710072, China.State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an 710072, China.State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an 710072, China.State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an 710072, China.State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an 710072, China.Recent advancements in two-dimensional materials have shown huge potential for optoelectronic applications. It is challenging to achieve highly effective and sensitive broadband photodetection based on MoS2 devices. Defect engineering, such as introducing vacancies, can narrow the bandgap and boost the separation of photogenerated carriers by defect states but leads to a slow response speed. Herein, we propose a nickel nanoparticle-induced gateless photogating effect with a unique energy band structure to enable the application of defect engineering and achieve high optoelectronic performance. The device based on Ni nanoparticle-decorated MoS2 with S vacancies exhibited high responsivities of 106.21 and 1.38 A W−1 and detectivities of 1.9 × 1012 and 8.9 × 109 Jones under 532 and 980 nm illumination (visible to near infrared), respectively, with highly accelerated response speed. This strategy provides new insight into optimizing defect engineering to design high-performance optoelectronic devices capable of broadband photodetection.https://spj.science.org/doi/10.34133/research.0195
spellingShingle Ran Duan
Weihong Qi
Panke Li
Kewei Tang
Guoliang Ru
Weimin Liu
A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles
Research
title A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles
title_full A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles
title_fullStr A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles
title_full_unstemmed A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles
title_short A High-Performance MoS2-Based Visible–Near-Infrared Photodetector from Gateless Photogating Effect Induced by Nickel Nanoparticles
title_sort high performance mos2 based visible near infrared photodetector from gateless photogating effect induced by nickel nanoparticles
url https://spj.science.org/doi/10.34133/research.0195
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