Tin, The Enabler—Hydrogen Diffusion into Ruthenium
Hydrogen interaction with ruthenium is of particular importance for the ruthenium-capped multilayer reflectors used in extreme ultraviolet (EUV) lithography. Hydrogen causes blistering, which leads to a loss of reflectivity. This problem is aggravated by tin. This study aims to uncover the mechanism...
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| Language: | English |
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MDPI AG
2019-01-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/9/1/129 |
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| author | Chidozie Onwudinanti Ionuţ Tranca Thomas Morgan Shuxia Tao |
| author_facet | Chidozie Onwudinanti Ionuţ Tranca Thomas Morgan Shuxia Tao |
| author_sort | Chidozie Onwudinanti |
| collection | DOAJ |
| description | Hydrogen interaction with ruthenium is of particular importance for the ruthenium-capped multilayer reflectors used in extreme ultraviolet (EUV) lithography. Hydrogen causes blistering, which leads to a loss of reflectivity. This problem is aggravated by tin. This study aims to uncover the mechanism via which tin affects the hydrogen uptake, with a view to mitigation. We report here the results of a study of hydrogen interaction with the ruthenium surface in the presence of tin using Density Functional Theory and charge density analyses. Our calculations show a significant drop in the energy barrier to hydrogen penetration when a tin atom or a tin hydride molecule (SnH<sub>x</sub>) is adsorbed on the ruthenium surface; the barrier has been found to drop in all tested cases with tin, from 1.06 eV to as low as 0.28 eV in the case of stannane (SnH<sub>4</sub>). Analyses show that, due to charge transfer from the less electronegative tin to hydrogen and ruthenium, charge accumulates around the diffusing hydrogen atom and near the ruthenium surface atoms. The reduced atomic volume of hydrogen, together with the effect of electron⁻electron repulsion from the ruthenium surface charge, facilitates subsurface penetration. Understanding the nature of tin’s influence on hydrogen penetration will guide efforts to mitigate blistering damage of EUV optics. It also holds great interest for applications where hydrogen penetration is desirable, such as hydrogen storage. |
| first_indexed | 2024-12-13T01:46:43Z |
| format | Article |
| id | doaj.art-a3c2d8eb9b354ee597946d1d61d2b588 |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-12-13T01:46:43Z |
| publishDate | 2019-01-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-a3c2d8eb9b354ee597946d1d61d2b5882022-12-22T00:03:37ZengMDPI AGNanomaterials2079-49912019-01-019112910.3390/nano9010129nano9010129Tin, The Enabler—Hydrogen Diffusion into RutheniumChidozie Onwudinanti0Ionuţ Tranca1Thomas Morgan2Shuxia Tao3Center for Computational Energy Research, DIFFER—Dutch Institute for Fundamental Energy Research, 5612 AJ Eindhoven, The NetherlandsDepartment of Mechanical Engineering, Eindhoven University of Technology, 5600 MB Eindhoven, The NetherlandsPlasma Material Interactions, DIFFER—Dutch Institute for Fundamental Energy Research, 5612 AJ Eindhoven, The NetherlandsCenter for Computational Energy Research, Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The NetherlandsHydrogen interaction with ruthenium is of particular importance for the ruthenium-capped multilayer reflectors used in extreme ultraviolet (EUV) lithography. Hydrogen causes blistering, which leads to a loss of reflectivity. This problem is aggravated by tin. This study aims to uncover the mechanism via which tin affects the hydrogen uptake, with a view to mitigation. We report here the results of a study of hydrogen interaction with the ruthenium surface in the presence of tin using Density Functional Theory and charge density analyses. Our calculations show a significant drop in the energy barrier to hydrogen penetration when a tin atom or a tin hydride molecule (SnH<sub>x</sub>) is adsorbed on the ruthenium surface; the barrier has been found to drop in all tested cases with tin, from 1.06 eV to as low as 0.28 eV in the case of stannane (SnH<sub>4</sub>). Analyses show that, due to charge transfer from the less electronegative tin to hydrogen and ruthenium, charge accumulates around the diffusing hydrogen atom and near the ruthenium surface atoms. The reduced atomic volume of hydrogen, together with the effect of electron⁻electron repulsion from the ruthenium surface charge, facilitates subsurface penetration. Understanding the nature of tin’s influence on hydrogen penetration will guide efforts to mitigate blistering damage of EUV optics. It also holds great interest for applications where hydrogen penetration is desirable, such as hydrogen storage.https://www.mdpi.com/2079-4991/9/1/129DFTsurfacehydrogenrutheniumtintransition stateelectronegativitybond order |
| spellingShingle | Chidozie Onwudinanti Ionuţ Tranca Thomas Morgan Shuxia Tao Tin, The Enabler—Hydrogen Diffusion into Ruthenium Nanomaterials DFT surface hydrogen ruthenium tin transition state electronegativity bond order |
| title | Tin, The Enabler—Hydrogen Diffusion into Ruthenium |
| title_full | Tin, The Enabler—Hydrogen Diffusion into Ruthenium |
| title_fullStr | Tin, The Enabler—Hydrogen Diffusion into Ruthenium |
| title_full_unstemmed | Tin, The Enabler—Hydrogen Diffusion into Ruthenium |
| title_short | Tin, The Enabler—Hydrogen Diffusion into Ruthenium |
| title_sort | tin the enabler hydrogen diffusion into ruthenium |
| topic | DFT surface hydrogen ruthenium tin transition state electronegativity bond order |
| url | https://www.mdpi.com/2079-4991/9/1/129 |
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