High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film

Abstract Thermal effect of semiconductor lasers is the biggest challenge to the development of semiconductor lasers. This problem limits the life and performance of high‐power laser diode. In this letter, we have reduced the thermal resistance of laser to enhance its heat dissipation capability. For...

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Main Authors: Yuancheng Wang, Aiyi Qi, Yufei Wang, Hongwei Qu, Wanhua Zheng
Format: Article
Language:English
Published: Wiley 2021-07-01
Series:Electronics Letters
Subjects:
Online Access:https://doi.org/10.1049/ell2.12168
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author Yuancheng Wang
Aiyi Qi
Yufei Wang
Hongwei Qu
Wanhua Zheng
author_facet Yuancheng Wang
Aiyi Qi
Yufei Wang
Hongwei Qu
Wanhua Zheng
author_sort Yuancheng Wang
collection DOAJ
description Abstract Thermal effect of semiconductor lasers is the biggest challenge to the development of semiconductor lasers. This problem limits the life and performance of high‐power laser diode. In this letter, we have reduced the thermal resistance of laser to enhance its heat dissipation capability. For this, we choose aluminium nitride (AlN) to replace traditional materials as insulating layer, as well as a passivation film for facet coating. The impact of insulation layer and facet coating on the thermal rollover process is analyzed. Finite element method simulations are compared with the experimental result. The comparison shows that the thermal resistance of the laser with the new insulating layer is reduced compared with normal laser diodes (LD). Eventually, the maximum conversion efficiency is 67.5% at room temperature and thermal resistance is 1.81C° W–1.
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spelling doaj.art-a3e0e0cdc49f4347a44c4a15a286a5c32022-12-22T01:44:58ZengWileyElectronics Letters0013-51941350-911X2021-07-01571456456610.1049/ell2.12168High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating filmYuancheng Wang0Aiyi Qi1Yufei Wang2Hongwei Qu3Wanhua Zheng4Laboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors Chinese Academy of Sciences Beijing ChinaLaboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors Chinese Academy of Sciences Beijing ChinaLaboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors Chinese Academy of Sciences Beijing ChinaLaboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors Chinese Academy of Sciences Beijing ChinaLaboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors Chinese Academy of Sciences Beijing ChinaAbstract Thermal effect of semiconductor lasers is the biggest challenge to the development of semiconductor lasers. This problem limits the life and performance of high‐power laser diode. In this letter, we have reduced the thermal resistance of laser to enhance its heat dissipation capability. For this, we choose aluminium nitride (AlN) to replace traditional materials as insulating layer, as well as a passivation film for facet coating. The impact of insulation layer and facet coating on the thermal rollover process is analyzed. Finite element method simulations are compared with the experimental result. The comparison shows that the thermal resistance of the laser with the new insulating layer is reduced compared with normal laser diodes (LD). Eventually, the maximum conversion efficiency is 67.5% at room temperature and thermal resistance is 1.81C° W–1.https://doi.org/10.1049/ell2.12168Lasing action in semiconductorsOther optical materialsOptical coatingsII-VI and III-V semiconductorsOptical materialsOptical coatings and filters
spellingShingle Yuancheng Wang
Aiyi Qi
Yufei Wang
Hongwei Qu
Wanhua Zheng
High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
Electronics Letters
Lasing action in semiconductors
Other optical materials
Optical coatings
II-VI and III-V semiconductors
Optical materials
Optical coatings and filters
title High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
title_full High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
title_fullStr High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
title_full_unstemmed High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
title_short High efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
title_sort high efficiency low thermal resistance semiconductor laser with novel insulating layer and coating film
topic Lasing action in semiconductors
Other optical materials
Optical coatings
II-VI and III-V semiconductors
Optical materials
Optical coatings and filters
url https://doi.org/10.1049/ell2.12168
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AT yufeiwang highefficiencylowthermalresistancesemiconductorlaserwithnovelinsulatinglayerandcoatingfilm
AT hongweiqu highefficiencylowthermalresistancesemiconductorlaserwithnovelinsulatinglayerandcoatingfilm
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