Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering
Hafnium oxide thin films have attracted great attention as promising materials for applications in the field of optical thin films and microelectronic devices. In this paper, hafnium oxide thin films were prepared via DC magnetron sputtering deposition on a quartz substrate. The influence of various...
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MDPI AG
2023-09-01
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| Series: | Micromachines |
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| Online Access: | https://www.mdpi.com/2072-666X/14/9/1800 |
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| author | Yingxue Xi Xinghui Qin Wantong Li Xi Luo Jin Zhang Weiguo Liu Pengfei Yang |
| author_facet | Yingxue Xi Xinghui Qin Wantong Li Xi Luo Jin Zhang Weiguo Liu Pengfei Yang |
| author_sort | Yingxue Xi |
| collection | DOAJ |
| description | Hafnium oxide thin films have attracted great attention as promising materials for applications in the field of optical thin films and microelectronic devices. In this paper, hafnium oxide thin films were prepared via DC magnetron sputtering deposition on a quartz substrate. The influence of various negative biases on the structure, morphology, and mechanical and optical properties of the obtained films were also evaluated. XRD results indicated that (<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mrow><mover accent="false"><mrow><mn>1</mn></mrow><mo>¯</mo></mover><mn>11</mn></mrow></semantics></math></inline-formula>)-oriented thin films with a monoclinic phase could be obtained under the non-bias applied conditions. Increasing the negative bias could refine the grain size and inhibit the grain preferred orientation of the thin films. Moreover, the surface quality and mechanical and optical properties of the films could be improved significantly along with the increase in the negative bias and then deteriorated as the negative bias voltage arrived at −50 V. It is evident that the negative bias is an effective modulation means to modify the microstructural, mechanical, and optical properties of the films. |
| first_indexed | 2024-03-10T22:27:18Z |
| format | Article |
| id | doaj.art-a4f9fc42cc6f421097ebfa2277fa1023 |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-10T22:27:18Z |
| publishDate | 2023-09-01 |
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| series | Micromachines |
| spelling | doaj.art-a4f9fc42cc6f421097ebfa2277fa10232023-11-19T12:00:48ZengMDPI AGMicromachines2072-666X2023-09-01149180010.3390/mi14091800Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron SputteringYingxue Xi0Xinghui Qin1Wantong Li2Xi Luo3Jin Zhang4Weiguo Liu5Pengfei Yang6School of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710021, ChinaHafnium oxide thin films have attracted great attention as promising materials for applications in the field of optical thin films and microelectronic devices. In this paper, hafnium oxide thin films were prepared via DC magnetron sputtering deposition on a quartz substrate. The influence of various negative biases on the structure, morphology, and mechanical and optical properties of the obtained films were also evaluated. XRD results indicated that (<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mrow><mover accent="false"><mrow><mn>1</mn></mrow><mo>¯</mo></mover><mn>11</mn></mrow></semantics></math></inline-formula>)-oriented thin films with a monoclinic phase could be obtained under the non-bias applied conditions. Increasing the negative bias could refine the grain size and inhibit the grain preferred orientation of the thin films. Moreover, the surface quality and mechanical and optical properties of the films could be improved significantly along with the increase in the negative bias and then deteriorated as the negative bias voltage arrived at −50 V. It is evident that the negative bias is an effective modulation means to modify the microstructural, mechanical, and optical properties of the films.https://www.mdpi.com/2072-666X/14/9/1800HfO<sub>2</sub>reactive magnetron sputteringnegative biasoptical propertieslaser-induced damage threshold |
| spellingShingle | Yingxue Xi Xinghui Qin Wantong Li Xi Luo Jin Zhang Weiguo Liu Pengfei Yang Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering Micromachines HfO<sub>2</sub> reactive magnetron sputtering negative bias optical properties laser-induced damage threshold |
| title | Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering |
| title_full | Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering |
| title_fullStr | Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering |
| title_full_unstemmed | Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering |
| title_short | Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering |
| title_sort | effect of substrate negative bias on the microstructural optical mechanical and laser damage resistance properties of hfo sub 2 sub thin films grown by dc reactive magnetron sputtering |
| topic | HfO<sub>2</sub> reactive magnetron sputtering negative bias optical properties laser-induced damage threshold |
| url | https://www.mdpi.com/2072-666X/14/9/1800 |
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