Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering

Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering

Hafnium oxide thin films have attracted great attention as promising materials for applications in the field of optical thin films and microelectronic devices. In this paper, hafnium oxide thin films were prepared via DC magnetron sputtering deposition on a quartz substrate. The influence of various...

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Bibliographic Details
Main Authors: Yingxue Xi, Xinghui Qin, Wantong Li, Xi Luo, Jin Zhang, Weiguo Liu, Pengfei Yang
Format: Article
Language:English
Published: MDPI AG 2023-09-01
Series:Micromachines
Subjects:
HfO<sub>2</sub>
reactive magnetron sputtering
negative bias
optical properties
laser-induced damage threshold
Online Access:https://www.mdpi.com/2072-666X/14/9/1800

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