On the Viscoelastic Drift Behavior During Nanoindentation

Nanoindentation measurements frequently involve a hold period at the peak load to allow the material to reach a stabilized state. A dwell time is also commonly employed at a sufficiently low load after unloading, to quantify the thermal drift for correction of the raw load-displacement data. This co...

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Main Author: Yu-Lin Shen
Format: Article
Language:English
Published: Frontiers Media S.A. 2022-04-01
Series:Frontiers in Materials
Subjects:
Online Access:https://www.frontiersin.org/articles/10.3389/fmats.2022.900088/full
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author Yu-Lin Shen
author_facet Yu-Lin Shen
author_sort Yu-Lin Shen
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description Nanoindentation measurements frequently involve a hold period at the peak load to allow the material to reach a stabilized state. A dwell time is also commonly employed at a sufficiently low load after unloading, to quantify the thermal drift for correction of the raw load-displacement data. This communication presents numerical case studies of indentation loading on a viscoelastic thin film using the finite element method. We illustrate that a simple viscoelastic material can actually induce prominent drift even under a low indentation load. The drift is caused by the material itself, unrelated to the thermal drift of the instrument. The direction and magnitude of the viscoelastic drift are controlled by the prior loading/unloading history as well as the load-displacement response of the fully relaxed elastic state.
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spelling doaj.art-a5566275ce83488caa7ac0b88ed8867a2022-12-22T02:55:50ZengFrontiers Media S.A.Frontiers in Materials2296-80162022-04-01910.3389/fmats.2022.900088900088On the Viscoelastic Drift Behavior During NanoindentationYu-Lin ShenNanoindentation measurements frequently involve a hold period at the peak load to allow the material to reach a stabilized state. A dwell time is also commonly employed at a sufficiently low load after unloading, to quantify the thermal drift for correction of the raw load-displacement data. This communication presents numerical case studies of indentation loading on a viscoelastic thin film using the finite element method. We illustrate that a simple viscoelastic material can actually induce prominent drift even under a low indentation load. The drift is caused by the material itself, unrelated to the thermal drift of the instrument. The direction and magnitude of the viscoelastic drift are controlled by the prior loading/unloading history as well as the load-displacement response of the fully relaxed elastic state.https://www.frontiersin.org/articles/10.3389/fmats.2022.900088/fullnanoindentationviscoelasticitythermal driftmodelingdeformation
spellingShingle Yu-Lin Shen
On the Viscoelastic Drift Behavior During Nanoindentation
Frontiers in Materials
nanoindentation
viscoelasticity
thermal drift
modeling
deformation
title On the Viscoelastic Drift Behavior During Nanoindentation
title_full On the Viscoelastic Drift Behavior During Nanoindentation
title_fullStr On the Viscoelastic Drift Behavior During Nanoindentation
title_full_unstemmed On the Viscoelastic Drift Behavior During Nanoindentation
title_short On the Viscoelastic Drift Behavior During Nanoindentation
title_sort on the viscoelastic drift behavior during nanoindentation
topic nanoindentation
viscoelasticity
thermal drift
modeling
deformation
url https://www.frontiersin.org/articles/10.3389/fmats.2022.900088/full
work_keys_str_mv AT yulinshen ontheviscoelasticdriftbehaviorduringnanoindentation