Reduced material loss in thin-film lithium niobate waveguides
Thin-film lithium niobate has shown promise for scalable applications ranging from single-photon sources to high-bandwidth data communication systems. Realization of the next generation high-performance classical and quantum devices, however, requires much lower optical losses than the current state...
Main Authors: | , , , , , , , , , , , , , , |
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Format: | Article |
Language: | English |
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AIP Publishing LLC
2022-08-01
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Series: | APL Photonics |
Online Access: | http://dx.doi.org/10.1063/5.0095146 |
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author | Amirhassan Shams-Ansari Guanhao Huang Lingyan He Zihan Li Jeffrey Holzgrafe Marc Jankowski Mikhail Churaev Prashanta Kharel Rebecca Cheng Di Zhu Neil Sinclair Boris Desiatov Mian Zhang Tobias J. Kippenberg Marko Lončar |
author_facet | Amirhassan Shams-Ansari Guanhao Huang Lingyan He Zihan Li Jeffrey Holzgrafe Marc Jankowski Mikhail Churaev Prashanta Kharel Rebecca Cheng Di Zhu Neil Sinclair Boris Desiatov Mian Zhang Tobias J. Kippenberg Marko Lončar |
author_sort | Amirhassan Shams-Ansari |
collection | DOAJ |
description | Thin-film lithium niobate has shown promise for scalable applications ranging from single-photon sources to high-bandwidth data communication systems. Realization of the next generation high-performance classical and quantum devices, however, requires much lower optical losses than the current state of the art resonator (Q-factor of ∼10 million). Yet the material limitations of ion-sliced thin film lithium niobate have not been explored; therefore, it is unclear how high the quality factor can be achieved in this platform. Here, using our newly developed characterization method, we find out that the material limited quality factor of thin film lithium niobate photonic platform can be improved using post-fabrication annealing and can be as high as Q ≈ 1.6 × 108 at telecommunication wavelengths, corresponding to a propagation loss of 0.2 dB/m. |
first_indexed | 2024-12-10T05:55:39Z |
format | Article |
id | doaj.art-a5c446885dce4d03ad9d9237ccdc5a6d |
institution | Directory Open Access Journal |
issn | 2378-0967 |
language | English |
last_indexed | 2024-12-10T05:55:39Z |
publishDate | 2022-08-01 |
publisher | AIP Publishing LLC |
record_format | Article |
series | APL Photonics |
spelling | doaj.art-a5c446885dce4d03ad9d9237ccdc5a6d2022-12-22T01:59:56ZengAIP Publishing LLCAPL Photonics2378-09672022-08-0178081301081301-710.1063/5.0095146Reduced material loss in thin-film lithium niobate waveguidesAmirhassan Shams-Ansari0Guanhao Huang1Lingyan He2Zihan Li3Jeffrey Holzgrafe4Marc Jankowski5Mikhail Churaev6Prashanta Kharel7Rebecca Cheng8Di Zhu9Neil Sinclair10Boris Desiatov11Mian Zhang12Tobias J. Kippenberg13Marko Lončar14John A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAInstitute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, SwitzerlandHyperLight, 501 Massachusetts Avenue, Cambridge, Massachusetts 02139, USAInstitute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, SwitzerlandJohn A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAE. L. Ginzton Laboratory, Stanford University, 348 Via Pueblo Mall, Stanford, California 94305, USAInstitute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, SwitzerlandHyperLight, 501 Massachusetts Avenue, Cambridge, Massachusetts 02139, USAJohn A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAJohn A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAJohn A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAJohn A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAHyperLight, 501 Massachusetts Avenue, Cambridge, Massachusetts 02139, USAInstitute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, SwitzerlandJohn A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, USAThin-film lithium niobate has shown promise for scalable applications ranging from single-photon sources to high-bandwidth data communication systems. Realization of the next generation high-performance classical and quantum devices, however, requires much lower optical losses than the current state of the art resonator (Q-factor of ∼10 million). Yet the material limitations of ion-sliced thin film lithium niobate have not been explored; therefore, it is unclear how high the quality factor can be achieved in this platform. Here, using our newly developed characterization method, we find out that the material limited quality factor of thin film lithium niobate photonic platform can be improved using post-fabrication annealing and can be as high as Q ≈ 1.6 × 108 at telecommunication wavelengths, corresponding to a propagation loss of 0.2 dB/m.http://dx.doi.org/10.1063/5.0095146 |
spellingShingle | Amirhassan Shams-Ansari Guanhao Huang Lingyan He Zihan Li Jeffrey Holzgrafe Marc Jankowski Mikhail Churaev Prashanta Kharel Rebecca Cheng Di Zhu Neil Sinclair Boris Desiatov Mian Zhang Tobias J. Kippenberg Marko Lončar Reduced material loss in thin-film lithium niobate waveguides APL Photonics |
title | Reduced material loss in thin-film lithium niobate waveguides |
title_full | Reduced material loss in thin-film lithium niobate waveguides |
title_fullStr | Reduced material loss in thin-film lithium niobate waveguides |
title_full_unstemmed | Reduced material loss in thin-film lithium niobate waveguides |
title_short | Reduced material loss in thin-film lithium niobate waveguides |
title_sort | reduced material loss in thin film lithium niobate waveguides |
url | http://dx.doi.org/10.1063/5.0095146 |
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