High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency
<p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bip...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2007-01-01
|
| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.1007/s11671-007-9042-z |
| _version_ | 1797706805457977344 |
|---|---|
| author | Strýhal Z Pavlík J Šícha J Heřman D Musil J |
| author_facet | Strýhal Z Pavlík J Šícha J Heřman D Musil J |
| author_sort | Strýhal Z |
| collection | DOAJ |
| description | <p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T<sub>surf</sub>measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f<sub>r</sub>was investigated in detail. It was found that the increase of f<sub>r</sub>from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a<sub>D</sub>of sputtered TiO<sub>2</sub>films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO<sub>2</sub>films can be sputtered on unheated glass substrates at a<sub>D</sub> = 80 nm/min, T<sub>surf</sub> < 180 °C when high value of f<sub>r</sub> = 350 kHz was used. Properties of a thin hydrophilic TiO<sub>2</sub>film deposited on a polycarbonate substrate are given.</p> |
| first_indexed | 2024-03-12T05:57:48Z |
| format | Article |
| id | doaj.art-a5cfd3dbd880444d8cbedf1ee5a4bf18 |
| institution | Directory Open Access Journal |
| issn | 1931-7573 1556-276X |
| language | English |
| last_indexed | 2024-03-12T05:57:48Z |
| publishDate | 2007-01-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Nanoscale Research Letters |
| spelling | doaj.art-a5cfd3dbd880444d8cbedf1ee5a4bf182023-09-03T04:26:27ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2007-01-0123123129High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequencyStrýhal ZPavlík JŠícha JHeřman DMusil J<p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T<sub>surf</sub>measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f<sub>r</sub>was investigated in detail. It was found that the increase of f<sub>r</sub>from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a<sub>D</sub>of sputtered TiO<sub>2</sub>films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO<sub>2</sub>films can be sputtered on unheated glass substrates at a<sub>D</sub> = 80 nm/min, T<sub>surf</sub> < 180 °C when high value of f<sub>r</sub> = 350 kHz was used. Properties of a thin hydrophilic TiO<sub>2</sub>film deposited on a polycarbonate substrate are given.</p>http://dx.doi.org/10.1007/s11671-007-9042-zTiO<sub>2</sub>filmHydrophilicityDeposition rateUnheated substrateDual magnetron sputteringPolycarbonate |
| spellingShingle | Strýhal Z Pavlík J Šícha J Heřman D Musil J High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency Nanoscale Research Letters TiO<sub>2</sub>film Hydrophilicity Deposition rate Unheated substrate Dual magnetron sputtering Polycarbonate |
| title | High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency |
| title_full | High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency |
| title_fullStr | High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency |
| title_full_unstemmed | High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency |
| title_short | High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency |
| title_sort | high rate low temperature dc pulsed magnetron sputtering of photocatalytic tio sub 2 sub films the effect of repetition frequency |
| topic | TiO<sub>2</sub>film Hydrophilicity Deposition rate Unheated substrate Dual magnetron sputtering Polycarbonate |
| url | http://dx.doi.org/10.1007/s11671-007-9042-z |
| work_keys_str_mv | AT str253halz highratelowtemperaturedcpulsedmagnetronsputteringofphotocatalytictiosub2subfilmstheeffectofrepetitionfrequency AT pavl237kj highratelowtemperaturedcpulsedmagnetronsputteringofphotocatalytictiosub2subfilmstheeffectofrepetitionfrequency AT 352237chaj highratelowtemperaturedcpulsedmagnetronsputteringofphotocatalytictiosub2subfilmstheeffectofrepetitionfrequency AT he345mand highratelowtemperaturedcpulsedmagnetronsputteringofphotocatalytictiosub2subfilmstheeffectofrepetitionfrequency AT musilj highratelowtemperaturedcpulsedmagnetronsputteringofphotocatalytictiosub2subfilmstheeffectofrepetitionfrequency |