A Novel Carbon-Assisted Chemical Vapor Deposition Growth of Large-Area Uniform Monolayer MoS<sub>2</sub> and WS<sub>2</sub>

A Novel Carbon-Assisted Chemical Vapor Deposition Growth of Large-Area Uniform Monolayer MoS<sub>2</sub> and WS<sub>2</sub>

Monolayer MoS<sub>2</sub> can be used for various applications such as flexible optoelectronics and electronics due to its exceptional optical and electronic properties. For these applications, large-area synthesis of high-quality monolayer MoS<sub>2</sub> is highly desirable...

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Bibliographic Details
Main Authors: Jeonghwan Bae, Youngdong Yoo
Format: Article
Language:English
Published: MDPI AG 2021-09-01
Series:Nanomaterials
Subjects:
carbon-assisted CVD
growth mechanism
monolayer
MoS<sub>2</sub>
WS<sub>2</sub>
Online Access:https://www.mdpi.com/2079-4991/11/9/2423

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