Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared
Abstract Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging work because of cost...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2021-03-01
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| Series: | Microsystems & Nanoengineering |
| Online Access: | https://doi.org/10.1038/s41378-020-00237-8 |
| _version_ | 1818575979523604480 |
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| author | Dasol Lee Myeongcheol Go Minkyung Kim Junho Jang Chungryong Choi Jin Kon Kim Junsuk Rho |
| author_facet | Dasol Lee Myeongcheol Go Minkyung Kim Junho Jang Chungryong Choi Jin Kon Kim Junsuk Rho |
| author_sort | Dasol Lee |
| collection | DOAJ |
| description | Abstract Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging work because of costly and time-consuming lithography methods and thermolability of materials, respectively. Here, we demonstrate a thermally robust titanium nitride broadband absorber with >95% absorption efficiency in the visible and near-infrared region (400–900 nm). A relatively large-scale (2.5 cm × 2.5 cm) absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures >600 ∘C. Such a large-scale, heat-tolerant, and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth, and absorption controlling in high-temperature conditions. |
| first_indexed | 2024-12-15T00:48:11Z |
| format | Article |
| id | doaj.art-a82ace1fc94e417787348dee806b2143 |
| institution | Directory Open Access Journal |
| issn | 2055-7434 |
| language | English |
| last_indexed | 2024-12-15T00:48:11Z |
| publishDate | 2021-03-01 |
| publisher | Nature Publishing Group |
| record_format | Article |
| series | Microsystems & Nanoengineering |
| spelling | doaj.art-a82ace1fc94e417787348dee806b21432022-12-21T22:41:29ZengNature Publishing GroupMicrosystems & Nanoengineering2055-74342021-03-01711810.1038/s41378-020-00237-8Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infraredDasol Lee0Myeongcheol Go1Minkyung Kim2Junho Jang3Chungryong Choi4Jin Kon Kim5Junsuk Rho6Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH)Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH)Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH)Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH)Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH)Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH)Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH)Abstract Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging work because of costly and time-consuming lithography methods and thermolability of materials, respectively. Here, we demonstrate a thermally robust titanium nitride broadband absorber with >95% absorption efficiency in the visible and near-infrared region (400–900 nm). A relatively large-scale (2.5 cm × 2.5 cm) absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures >600 ∘C. Such a large-scale, heat-tolerant, and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth, and absorption controlling in high-temperature conditions.https://doi.org/10.1038/s41378-020-00237-8 |
| spellingShingle | Dasol Lee Myeongcheol Go Minkyung Kim Junho Jang Chungryong Choi Jin Kon Kim Junsuk Rho Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared Microsystems & Nanoengineering |
| title | Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared |
| title_full | Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared |
| title_fullStr | Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared |
| title_full_unstemmed | Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared |
| title_short | Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared |
| title_sort | multiple patterning colloidal lithography implemented scalable manufacturing of heat tolerant titanium nitride broadband absorbers in the visible to near infrared |
| url | https://doi.org/10.1038/s41378-020-00237-8 |
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