Impact of water vapor annealing treatments on Al2O3/diamond interface
Our group developed the first inversion-type p-channel diamond metal–oxide–semiconductor field-effect transistor, which featured normally off properties by employing water vapor annealing treatments for the oxygen-terminated diamond surface. Despite the comprehensive device-grade characterization, t...
Main Authors: | Xufang Zhang, Tsubasa Matsumoto, Mitsuru Sometani, Masahiko Ogura, Hiromitsu Kato, Toshiharu Makino, Daisuke Takeuchi, Takao Inokuma, Satoshi Yamasaki, Norio Tokuda |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2024-03-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/5.0188372 |
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