Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering
Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through the reactive magnetron sputtering of a SiC target in an argon-nitrogen mixture. The deposition was carried out at room temperature and 300 °C and at an RF target power of 50–150 W. An increase in the...
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2023-02-01
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| Online Access: | https://www.mdpi.com/1996-1944/16/4/1467 |
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| author | Veronica S. Sulyaeva Alexey N. Kolodin Maxim N. Khomyakov Alexander K. Kozhevnikov Marina L. Kosinova |
| author_facet | Veronica S. Sulyaeva Alexey N. Kolodin Maxim N. Khomyakov Alexander K. Kozhevnikov Marina L. Kosinova |
| author_sort | Veronica S. Sulyaeva |
| collection | DOAJ |
| description | Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through the reactive magnetron sputtering of a SiC target in an argon-nitrogen mixture. The deposition was carried out at room temperature and 300 °C and at an RF target power of 50–150 W. An increase in the nitrogen flow rate leads to the formation of bonds between silicon and carbon atoms and nitrogen atoms and to the formation of SiC<sub>x</sub>N<sub>y</sub> layers. The as-deposited films were analyzed with respect to their element composition, state of chemical bonding, mechanical and optical properties, and wetting behavior. It was found that all synthesized films were amorphous and represented a mixture of SiC<sub>x</sub>N<sub>y</sub> with free carbon. The films’ surfaces were smooth and uniform, with a roughness of about 0.2 nm. Depending on the deposition conditions, SiC<sub>x</sub>N<sub>y</sub> films within the composition range 24.1 < Si < 44.0 at.%, 22.4 < C < 56.1 at.%, and 1.6 < N < 51.9 at.% were prepared. The contact angle values vary from 37° to 67°, the hardness values range from 16.2 to 34.4 GPa, and the optical band gap energy changes from 1.81 to 2.53 eV depending on the synthesis conditions of the SiC<sub>x</sub>N<sub>y</sub> layers. Particular attention was paid to the study of the stability of the elemental composition of the samples over time, which showed the invariance of the composition of the SiC<sub>x</sub>N<sub>y</sub> films for five months. |
| first_indexed | 2024-03-11T08:29:38Z |
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| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-03-11T08:29:38Z |
| publishDate | 2023-02-01 |
| publisher | MDPI AG |
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| series | Materials |
| spelling | doaj.art-a985a237886d45429c0d204f6193e2822023-11-16T21:50:18ZengMDPI AGMaterials1996-19442023-02-01164146710.3390/ma16041467Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron SputteringVeronica S. Sulyaeva0Alexey N. Kolodin1Maxim N. Khomyakov2Alexander K. Kozhevnikov3Marina L. Kosinova4Nikolaev Institute of Inorganic Chemistry SB RAS, 3, Acad. Lavrentiev Ave., 630090 Novosibirsk, RussiaNikolaev Institute of Inorganic Chemistry SB RAS, 3, Acad. Lavrentiev Ave., 630090 Novosibirsk, RussiaInstitute of Laser Physics SB RAS, 15B, Acad. Lavrentiev Ave., 630090 Novosibirsk, RussiaNikolaev Institute of Inorganic Chemistry SB RAS, 3, Acad. Lavrentiev Ave., 630090 Novosibirsk, RussiaNikolaev Institute of Inorganic Chemistry SB RAS, 3, Acad. Lavrentiev Ave., 630090 Novosibirsk, RussiaSilicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through the reactive magnetron sputtering of a SiC target in an argon-nitrogen mixture. The deposition was carried out at room temperature and 300 °C and at an RF target power of 50–150 W. An increase in the nitrogen flow rate leads to the formation of bonds between silicon and carbon atoms and nitrogen atoms and to the formation of SiC<sub>x</sub>N<sub>y</sub> layers. The as-deposited films were analyzed with respect to their element composition, state of chemical bonding, mechanical and optical properties, and wetting behavior. It was found that all synthesized films were amorphous and represented a mixture of SiC<sub>x</sub>N<sub>y</sub> with free carbon. The films’ surfaces were smooth and uniform, with a roughness of about 0.2 nm. Depending on the deposition conditions, SiC<sub>x</sub>N<sub>y</sub> films within the composition range 24.1 < Si < 44.0 at.%, 22.4 < C < 56.1 at.%, and 1.6 < N < 51.9 at.% were prepared. The contact angle values vary from 37° to 67°, the hardness values range from 16.2 to 34.4 GPa, and the optical band gap energy changes from 1.81 to 2.53 eV depending on the synthesis conditions of the SiC<sub>x</sub>N<sub>y</sub> layers. Particular attention was paid to the study of the stability of the elemental composition of the samples over time, which showed the invariance of the composition of the SiC<sub>x</sub>N<sub>y</sub> films for five months.https://www.mdpi.com/1996-1944/16/4/1467silicon carbonitride filmsmagnetron sputteringhydrophilic filmstunable optical propertiesmechanical propertiesfilm aging |
| spellingShingle | Veronica S. Sulyaeva Alexey N. Kolodin Maxim N. Khomyakov Alexander K. Kozhevnikov Marina L. Kosinova Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering Materials silicon carbonitride films magnetron sputtering hydrophilic films tunable optical properties mechanical properties film aging |
| title | Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering |
| title_full | Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering |
| title_fullStr | Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering |
| title_full_unstemmed | Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering |
| title_short | Enhanced Wettability, Hardness, and Tunable Optical Properties of SiC<sub>x</sub>N<sub>y</sub> Coatings Formed by Reactive Magnetron Sputtering |
| title_sort | enhanced wettability hardness and tunable optical properties of sic sub x sub n sub y sub coatings formed by reactive magnetron sputtering |
| topic | silicon carbonitride films magnetron sputtering hydrophilic films tunable optical properties mechanical properties film aging |
| url | https://www.mdpi.com/1996-1944/16/4/1467 |
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