One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calcula...

وصف كامل

التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: Xianhua Tan, Tielin Shi, Jianbin Lin, Bo Sun, Zirong Tang, Guanglan Liao
التنسيق: مقال
اللغة:English
منشور في: SpringerOpen 2018-12-01
سلاسل:Nanoscale Research Letters
الموضوعات:
الوصول للمادة أونلاين:http://link.springer.com/article/10.1186/s11671-018-2817-6