One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calcula...

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Podrobná bibliografie
Hlavní autoři: Xianhua Tan, Tielin Shi, Jianbin Lin, Bo Sun, Zirong Tang, Guanglan Liao
Médium: Článek
Jazyk:English
Vydáno: SpringerOpen 2018-12-01
Edice:Nanoscale Research Letters
Témata:
Three-dimensional suspended structure
Diffraction
Carbon microelectromechanical systems
Pyrolytic carbon structures
On-line přístup:http://link.springer.com/article/10.1186/s11671-018-2817-6

Internet

http://link.springer.com/article/10.1186/s11671-018-2817-6

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