One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calcula...

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Xehetasun bibliografikoak
Egile Nagusiak: Xianhua Tan, Tielin Shi, Jianbin Lin, Bo Sun, Zirong Tang, Guanglan Liao
Formatua: Artikulua
Hizkuntza:English
Argitaratua: SpringerOpen 2018-12-01
Saila:Nanoscale Research Letters
Gaiak:
Three-dimensional suspended structure
Diffraction
Carbon microelectromechanical systems
Pyrolytic carbon structures
Sarrera elektronikoa:http://link.springer.com/article/10.1186/s11671-018-2817-6

Internet

http://link.springer.com/article/10.1186/s11671-018-2817-6

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