One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calcula...

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書目詳細資料
Main Authors: Xianhua Tan, Tielin Shi, Jianbin Lin, Bo Sun, Zirong Tang, Guanglan Liao
格式: Article
語言:English
出版: SpringerOpen 2018-12-01
叢編:Nanoscale Research Letters
主題:
在線閱讀:http://link.springer.com/article/10.1186/s11671-018-2817-6