Effect of Plasma Treatment on the Luminescent and Scintillation Properties of Thick ZnO Films Fabricated by Sputtering of a Hot Ceramic Target

Effect of Plasma Treatment on the Luminescent and Scintillation Properties of Thick ZnO Films Fabricated by Sputtering of a Hot Ceramic Target

The paper presents the results of a comprehensive study of the structural-phase composition, morphology, optical, luminescent, and scintillation characteristics of thick ZnO films fabricated by magnetron sputtering. By using a hot ceramic target, extremely rapid growth (~50 µm/h) of ZnO microfilms m...

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Detalles Bibliográficos
Autores principales: Andrey P. Tarasov, Abubakar M. Ismailov, Makhach Kh. Gadzhiev, Ivan D. Venevtsev, Arsen E. Muslimov, Ivan S. Volchkov, Samira R. Aidamirova, Alexandr S. Tyuftyaev, Andrey V. Butashin, Vladimir M. Kanevsky
Formato: Artículo
Lenguaje:English
Publicado: MDPI AG 2023-12-01
Colección:Photonics
Materias:
ZnO
thick films
plasma treatment
scintillator
X-ray luminescence
photoluminescence
Acceso en línea:https://www.mdpi.com/2304-6732/10/12/1354

Internet

https://www.mdpi.com/2304-6732/10/12/1354

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