Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition

Abstract We developed a Joule heating decomposition (JHD) method, which applied direct current on the SiC for the epitaxial growth of multi-layer graphene (MLG) films on Si-terminated (0001) face of the high doping 4H-SiC substrate. By this JHD method, the growth time for preparing MLG was only seve...

Full description

Bibliographic Details
Main Authors: Zhiwei Zhang, Weiwei Cai, Rongdun Hong, Dingqu Lin, Xiaping Chen, Jiafa Cai, Zhengyun Wu
Format: Article
Language:English
Published: SpringerOpen 2018-07-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://link.springer.com/article/10.1186/s11671-018-2606-2
_version_ 1797760102048989184
author Zhiwei Zhang
Weiwei Cai
Rongdun Hong
Dingqu Lin
Xiaping Chen
Jiafa Cai
Zhengyun Wu
author_facet Zhiwei Zhang
Weiwei Cai
Rongdun Hong
Dingqu Lin
Xiaping Chen
Jiafa Cai
Zhengyun Wu
author_sort Zhiwei Zhang
collection DOAJ
description Abstract We developed a Joule heating decomposition (JHD) method, which applied direct current on the SiC for the epitaxial growth of multi-layer graphene (MLG) films on Si-terminated (0001) face of the high doping 4H-SiC substrate. By this JHD method, the growth time for preparing MLG was only several minutes. Raman spectroscopy was employed to study the influence of the temperature caused by the Joule heating on the quality and the uniformity of the sample. Then, other properties, such as the strain, the layer’s number, and the electric characteristics, of the MLG were studied in details. It was found that the quality of the MLG was substantially dependent on the growth temperature (operation current) and the growth time, while the layer’s number was only dependent on the growth temperature but not the growth time. Finally, less-defect and homogeneous MLG (~ 45 layers) with an area of ~ 12 × 5 mm2 could be obtained at a heating temperature of ~ 1470 °C with duration time of 5 min. By using the linear transmission line method, the specific contact resistance of Au and MLG was 5.03 × 10−5 Ω cm2, and the sheet resistance was 52.36 Ω/sq, respectively.
first_indexed 2024-03-12T18:53:47Z
format Article
id doaj.art-aa6067c5598c459aa8f31fbe17292b7f
institution Directory Open Access Journal
issn 1931-7573
1556-276X
language English
last_indexed 2024-03-12T18:53:47Z
publishDate 2018-07-01
publisher SpringerOpen
record_format Article
series Nanoscale Research Letters
spelling doaj.art-aa6067c5598c459aa8f31fbe17292b7f2023-08-02T07:00:31ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2018-07-011311710.1186/s11671-018-2606-2Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat DecompositionZhiwei Zhang0Weiwei Cai1Rongdun Hong2Dingqu Lin3Xiaping Chen4Jiafa Cai5Zhengyun Wu6Department of Physics, Xiamen UniversityDepartment of Physics, Xiamen UniversityDepartment of Physics, Xiamen UniversityDepartment of Physics, Xiamen UniversityDepartment of Physics, Xiamen UniversityDepartment of Physics, Xiamen UniversityDepartment of Physics, Xiamen UniversityAbstract We developed a Joule heating decomposition (JHD) method, which applied direct current on the SiC for the epitaxial growth of multi-layer graphene (MLG) films on Si-terminated (0001) face of the high doping 4H-SiC substrate. By this JHD method, the growth time for preparing MLG was only several minutes. Raman spectroscopy was employed to study the influence of the temperature caused by the Joule heating on the quality and the uniformity of the sample. Then, other properties, such as the strain, the layer’s number, and the electric characteristics, of the MLG were studied in details. It was found that the quality of the MLG was substantially dependent on the growth temperature (operation current) and the growth time, while the layer’s number was only dependent on the growth temperature but not the growth time. Finally, less-defect and homogeneous MLG (~ 45 layers) with an area of ~ 12 × 5 mm2 could be obtained at a heating temperature of ~ 1470 °C with duration time of 5 min. By using the linear transmission line method, the specific contact resistance of Au and MLG was 5.03 × 10−5 Ω cm2, and the sheet resistance was 52.36 Ω/sq, respectively.http://link.springer.com/article/10.1186/s11671-018-2606-2Carbon materialsSemiconductorsRaman
spellingShingle Zhiwei Zhang
Weiwei Cai
Rongdun Hong
Dingqu Lin
Xiaping Chen
Jiafa Cai
Zhengyun Wu
Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition
Nanoscale Research Letters
Carbon materials
Semiconductors
Raman
title Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition
title_full Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition
title_fullStr Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition
title_full_unstemmed Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition
title_short Raman Spectroscopy of Multi-Layer Graphene epitaxially Grown on 4H-SiC by Joule Heat Decomposition
title_sort raman spectroscopy of multi layer graphene epitaxially grown on 4h sic by joule heat decomposition
topic Carbon materials
Semiconductors
Raman
url http://link.springer.com/article/10.1186/s11671-018-2606-2
work_keys_str_mv AT zhiweizhang ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition
AT weiweicai ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition
AT rongdunhong ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition
AT dingqulin ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition
AT xiapingchen ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition
AT jiafacai ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition
AT zhengyunwu ramanspectroscopyofmultilayergrapheneepitaxiallygrownon4hsicbyjouleheatdecomposition