Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition

The preparation of YBCO superconducting films by using metal organic chemical deposition (MOD) involves low-temperature pyrolysis and high-temperature treatment. The former process generally requires the introduction of water vapor and other gases. The study on pyrolysis in a low vacuum environment...

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Main Authors: Zhao Yang, Chuanbing Cai, Ningdong Chu, Shuyun Tong, Yuming Lu, Zhiyong Liu
Format: Article
Language:English
Published: MDPI AG 2022-06-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/12/6/812
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author Zhao Yang
Chuanbing Cai
Ningdong Chu
Shuyun Tong
Yuming Lu
Zhiyong Liu
author_facet Zhao Yang
Chuanbing Cai
Ningdong Chu
Shuyun Tong
Yuming Lu
Zhiyong Liu
author_sort Zhao Yang
collection DOAJ
description The preparation of YBCO superconducting films by using metal organic chemical deposition (MOD) involves low-temperature pyrolysis and high-temperature treatment. The former process generally requires the introduction of water vapor and other gases. The study on pyrolysis in a low vacuum environment and non-carrier gas atmosphere has never been reported. In this work, we explored a low vacuum pyrolysis scheme with simple Argon gas decompression and a carrier-free atmosphere. The effects of heating rate on the microstructure of pyrolysis films were investigated, and the high-temperature treatment temperature (<i>T<sub>h</sub></i>) was also optimized. Compared with conventional pyrolysis, the present low-vacuum pyrolysis does not employ the flowing dry or wet gases, facilitating the internal gas release during film decomposition. More importantly, the efficiency was greatly improved with reduced pyrolysis time. The obtained film surface is free of CuO particle, which leads to a lower roughness. We also investigated the effect of <i>T<sub>h</sub></i> on the final YBCO film texture and superconductivity. As <i>T<sub>h</sub></i> increased from 810 °C to 815 °C, the BaCuO<sub>2</sub> phase decreased with enhanced <i>c</i>-axis orientation being evident by XRD and Raman spectra. As a result, the critical current density (<i>J<sub>c</sub></i>) increased from 0.38 MA/cm<sup>2</sup> to 1.2 MA/cm<sup>2</sup> (77 K, self-field).
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spelling doaj.art-aa9924462964485e8982bd9c1ec7c0422023-11-23T16:12:17ZengMDPI AGCrystals2073-43522022-06-0112681210.3390/cryst12060812Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical DepositionZhao Yang0Chuanbing Cai1Ningdong Chu2Shuyun Tong3Yuming Lu4Zhiyong Liu5Shanghai Key Laboratory of High Temperature Superconductors, Department of Physics, Shanghai University, Shanghai 200444, ChinaShanghai Key Laboratory of High Temperature Superconductors, Department of Physics, Shanghai University, Shanghai 200444, ChinaShanghai Key Laboratory of High Temperature Superconductors, Department of Physics, Shanghai University, Shanghai 200444, ChinaShanghai Key Laboratory of High Temperature Superconductors, Department of Physics, Shanghai University, Shanghai 200444, ChinaShanghai Key Laboratory of High Temperature Superconductors, Department of Physics, Shanghai University, Shanghai 200444, ChinaShanghai Key Laboratory of High Temperature Superconductors, Department of Physics, Shanghai University, Shanghai 200444, ChinaThe preparation of YBCO superconducting films by using metal organic chemical deposition (MOD) involves low-temperature pyrolysis and high-temperature treatment. The former process generally requires the introduction of water vapor and other gases. The study on pyrolysis in a low vacuum environment and non-carrier gas atmosphere has never been reported. In this work, we explored a low vacuum pyrolysis scheme with simple Argon gas decompression and a carrier-free atmosphere. The effects of heating rate on the microstructure of pyrolysis films were investigated, and the high-temperature treatment temperature (<i>T<sub>h</sub></i>) was also optimized. Compared with conventional pyrolysis, the present low-vacuum pyrolysis does not employ the flowing dry or wet gases, facilitating the internal gas release during film decomposition. More importantly, the efficiency was greatly improved with reduced pyrolysis time. The obtained film surface is free of CuO particle, which leads to a lower roughness. We also investigated the effect of <i>T<sub>h</sub></i> on the final YBCO film texture and superconductivity. As <i>T<sub>h</sub></i> increased from 810 °C to 815 °C, the BaCuO<sub>2</sub> phase decreased with enhanced <i>c</i>-axis orientation being evident by XRD and Raman spectra. As a result, the critical current density (<i>J<sub>c</sub></i>) increased from 0.38 MA/cm<sup>2</sup> to 1.2 MA/cm<sup>2</sup> (77 K, self-field).https://www.mdpi.com/2073-4352/12/6/812FF-MODlow vacuumYBCO filmepitaxial growthcritical current density
spellingShingle Zhao Yang
Chuanbing Cai
Ningdong Chu
Shuyun Tong
Yuming Lu
Zhiyong Liu
Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition
Crystals
FF-MOD
low vacuum
YBCO film
epitaxial growth
critical current density
title Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition
title_full Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition
title_fullStr Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition
title_full_unstemmed Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition
title_short Low-Vacuum Pyrolysis of YBCO Films by Using Fluorine-Free Metal Organic Chemical Deposition
title_sort low vacuum pyrolysis of ybco films by using fluorine free metal organic chemical deposition
topic FF-MOD
low vacuum
YBCO film
epitaxial growth
critical current density
url https://www.mdpi.com/2073-4352/12/6/812
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AT ningdongchu lowvacuumpyrolysisofybcofilmsbyusingfluorinefreemetalorganicchemicaldeposition
AT shuyuntong lowvacuumpyrolysisofybcofilmsbyusingfluorinefreemetalorganicchemicaldeposition
AT yuminglu lowvacuumpyrolysisofybcofilmsbyusingfluorinefreemetalorganicchemicaldeposition
AT zhiyongliu lowvacuumpyrolysisofybcofilmsbyusingfluorinefreemetalorganicchemicaldeposition