| Summary: | Sputter deposition, while varying the substrate temperature, is employed to isochemically control the structural state and concomitant mechanical response in a Pd-based metallic glass at the time of glass formation. Increasing the deposition temperature from 333 K to 461 K results in a 33.5% increase in hardness to 9.69 GPa for amorphous films. Further increasing the temperature leads to a decrease in hardness, indicating low and high temperature deposition regimes where increased surface mobility allows access to a more relaxed and more rejuvenated structure, respectively. Through this mechanism we access the range of achievable structural states, from ultrastable to highly liquid-like glasses.
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