Database Development of SiO<sub>2</sub> Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe

Database Development of SiO<sub>2</sub> Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe

In the semiconductor industry, fluorocarbon (FC) plasma is widely used in SiO<sub>2</sub> etching, with Ar typically employed in the dilution of the FC plasma due to its cost effectiveness and accessibility. While it has been reported that plasmas with other noble gases, namely Kr and Xe...

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Bibliographic Details
Main Authors:	Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, ShinJae You
Format:	Article
Language:	English
Published:	MDPI AG 2022-10-01
Series:	Nanomaterials
Subjects:	plasma etching plasma chemistry noble gas plasma diagnostics
Online Access:	https://www.mdpi.com/2079-4991/12/21/3828

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