Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System
This paper describes the development of a SCARA-type haptic device, which will be used to assist a human operator in non-contact object handling of silicon wafers using electrostatic levitation. The device has three degrees of freedom, of which only one (vertical) is actively controlled. By utilizin...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
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The Japan Society of Mechanical Engineers
2008-04-01
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| Series: | Journal of Advanced Mechanical Design, Systems, and Manufacturing |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/jamdsm/2/2/2_2_180/_pdf/-char/en |
| _version_ | 1811291887012675584 |
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| author | Ewoud van WEST Akio YAMAMOTO Benjamin BURNS Toshiro HIGUCHI |
| author_facet | Ewoud van WEST Akio YAMAMOTO Benjamin BURNS Toshiro HIGUCHI |
| author_sort | Ewoud van WEST |
| collection | DOAJ |
| description | This paper describes the development of a SCARA-type haptic device, which will be used to assist a human operator in non-contact object handling of silicon wafers using electrostatic levitation. The device has three degrees of freedom, of which only one (vertical) is actively controlled. By utilizing the admittance control paradigm, a high vertical stiffness and a high output force can be achieved. These properties are necessary for the intended application of non-contact object handling to prevent instabilities (induced by the human motion) of the electrostatic levitation system. As the nominal air gap between object and electrostatic levitator is in the order of 350 micrometer, with an allowable position error of about 150 micrometer, instability can easily occur if there is no haptic assistance, especially in the picking up or placing process. The developed SCARA-type haptic device has a mechanical stiffness of 51 N/mm for the vertical direction when it is in the weakest posture, which is sufficient for the non-contact handling task. The design and performance of the haptic device for the active vertical degree of freedom are described in this paper. |
| first_indexed | 2024-04-13T04:36:08Z |
| format | Article |
| id | doaj.art-ac4a191046c04a3ab657488060cd5126 |
| institution | Directory Open Access Journal |
| issn | 1881-3054 |
| language | English |
| last_indexed | 2024-04-13T04:36:08Z |
| publishDate | 2008-04-01 |
| publisher | The Japan Society of Mechanical Engineers |
| record_format | Article |
| series | Journal of Advanced Mechanical Design, Systems, and Manufacturing |
| spelling | doaj.art-ac4a191046c04a3ab657488060cd51262022-12-22T03:02:09ZengThe Japan Society of Mechanical EngineersJournal of Advanced Mechanical Design, Systems, and Manufacturing1881-30542008-04-012218019010.1299/jamdsm.2.180jamdsmDevelopment of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling SystemEwoud van WEST0Akio YAMAMOTO1Benjamin BURNS2Toshiro HIGUCHI3Advanced Mechatronics Laboratory, Department of Precision Engineering, School of Engineering, the University of TokyoAdvanced Mechatronics Laboratory, Department of Precision Engineering, School of Engineering, the University of TokyoLaboratoire de Systèmes Robotiques, Ecole Polytechnique Fédérale de LausanneAdvanced Mechatronics Laboratory, Department of Precision Engineering, School of Engineering, the University of TokyoThis paper describes the development of a SCARA-type haptic device, which will be used to assist a human operator in non-contact object handling of silicon wafers using electrostatic levitation. The device has three degrees of freedom, of which only one (vertical) is actively controlled. By utilizing the admittance control paradigm, a high vertical stiffness and a high output force can be achieved. These properties are necessary for the intended application of non-contact object handling to prevent instabilities (induced by the human motion) of the electrostatic levitation system. As the nominal air gap between object and electrostatic levitator is in the order of 350 micrometer, with an allowable position error of about 150 micrometer, instability can easily occur if there is no haptic assistance, especially in the picking up or placing process. The developed SCARA-type haptic device has a mechanical stiffness of 51 N/mm for the vertical direction when it is in the weakest posture, which is sufficient for the non-contact handling task. The design and performance of the haptic device for the active vertical degree of freedom are described in this paper.https://www.jstage.jst.go.jp/article/jamdsm/2/2/2_2_180/_pdf/-char/enscarahaptichaptic tweezerpick and placeman machine interface |
| spellingShingle | Ewoud van WEST Akio YAMAMOTO Benjamin BURNS Toshiro HIGUCHI Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System Journal of Advanced Mechanical Design, Systems, and Manufacturing scara haptic haptic tweezer pick and place man machine interface |
| title | Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System |
| title_full | Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System |
| title_fullStr | Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System |
| title_full_unstemmed | Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System |
| title_short | Development of SCARA-Type Haptic Device for Electrostatic Non-Contact Handling System |
| title_sort | development of scara type haptic device for electrostatic non contact handling system |
| topic | scara haptic haptic tweezer pick and place man machine interface |
| url | https://www.jstage.jst.go.jp/article/jamdsm/2/2/2_2_180/_pdf/-char/en |
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