Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data

Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data

In this study, we submit a complex set of in-situ data collected by optical emission spectroscopy (OES) during the process of aluminum nitride (AlN) thin film. Changing the sputtering power and nitrogen(N<sub>2</sub>) flow rate, AlN film was deposited on Si substrate using a superior spu...

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Bibliographic Details
Main Authors: Yu-Pu Yang, Te-Yun Lu, Hsiao-Han Lo, Wei-Lun Chen, Peter J. Wang, Walter Lai, Yiin-Kuen Fuh, Tomi T. Li
Format: Article
Language:English
Published: MDPI AG 2021-08-01
Series:Materials
Subjects:
machine learning
aluminum nitride (AlN)
principal component analysis (PCA)
artificial neural networks (ANNs)
in-situ
thin film stress
Online Access:https://www.mdpi.com/1996-1944/14/16/4445

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https://www.mdpi.com/1996-1944/14/16/4445

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