Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition

The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic pr...

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Main Authors: Alex Belianinov, Matthew J. Burch, Anton Ievlev, Songkil Kim, Michael G. Stanford, Kyle Mahady, Brett B. Lewis, Jason D. Fowlkes, Philip D. Rack, Olga S. Ovchinnikova
Format: Article
Language:English
Published: MDPI AG 2020-05-01
Series:Micromachines
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Online Access:https://www.mdpi.com/2072-666X/11/5/527
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author Alex Belianinov
Matthew J. Burch
Anton Ievlev
Songkil Kim
Michael G. Stanford
Kyle Mahady
Brett B. Lewis
Jason D. Fowlkes
Philip D. Rack
Olga S. Ovchinnikova
author_facet Alex Belianinov
Matthew J. Burch
Anton Ievlev
Songkil Kim
Michael G. Stanford
Kyle Mahady
Brett B. Lewis
Jason D. Fowlkes
Philip D. Rack
Olga S. Ovchinnikova
author_sort Alex Belianinov
collection DOAJ
description The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.
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spelling doaj.art-ae0c43b52be44250844b9d3cc26558132023-11-20T01:21:06ZengMDPI AGMicromachines2072-666X2020-05-0111552710.3390/mi11050527Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced DepositionAlex Belianinov0Matthew J. Burch1Anton Ievlev2Songkil Kim3Michael G. Stanford4Kyle Mahady5Brett B. Lewis6Jason D. Fowlkes7Philip D. Rack8Olga S. Ovchinnikova9Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USACenter for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USACenter for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USACenter for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USADepartment of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USADepartment of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USADepartment of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USACenter for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USACenter for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USACenter for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USAThe next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.https://www.mdpi.com/2072-666X/11/5/527helium ion microscopyfocused ion beam induced deposition3D nano-printingdirect-write nanofabrication
spellingShingle Alex Belianinov
Matthew J. Burch
Anton Ievlev
Songkil Kim
Michael G. Stanford
Kyle Mahady
Brett B. Lewis
Jason D. Fowlkes
Philip D. Rack
Olga S. Ovchinnikova
Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition
Micromachines
helium ion microscopy
focused ion beam induced deposition
3D nano-printing
direct-write nanofabrication
title Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition
title_full Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition
title_fullStr Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition
title_full_unstemmed Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition
title_short Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition
title_sort direct write of 3d nanoscale mesh objects with platinum precursor via focused helium ion beam induced deposition
topic helium ion microscopy
focused ion beam induced deposition
3D nano-printing
direct-write nanofabrication
url https://www.mdpi.com/2072-666X/11/5/527
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