Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications
Abstract We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and...
| Asıl Yazarlar: | , , , , |
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| Materyal Türü: | Makale |
| Dil: | English |
| Baskı/Yayın Bilgisi: |
SpringerOpen
2021-02-01
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| Seri Bilgileri: | Nanoscale Research Letters |
| Konular: | |
| Online Erişim: | https://doi.org/10.1186/s11671-021-03494-2 |