Porous single crystalline 4H silicon carbide rugate mirrors

Porous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge....

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Main Authors: Markus Leitgeb, Christopher Zellner, Michael Schneider, Ulrich Schmid
Format: Article
Language:English
Published: AIP Publishing LLC 2017-10-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5001876
_version_ 1819102489044058112
author Markus Leitgeb
Christopher Zellner
Michael Schneider
Ulrich Schmid
author_facet Markus Leitgeb
Christopher Zellner
Michael Schneider
Ulrich Schmid
author_sort Markus Leitgeb
collection DOAJ
description Porous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge. The resulting degree of porosity as well as the refractive index profile could be estimated with image processing, thus enabling the prediction of the peak position in the reflection spectrum of the mirrors. Furthermore the presented method allows the re-use of the 4H–SiC bulk sample for subsequent mirror fabrication.
first_indexed 2024-12-22T01:35:22Z
format Article
id doaj.art-af139663a86d413798658b3ba25c9f5c
institution Directory Open Access Journal
issn 2166-532X
language English
last_indexed 2024-12-22T01:35:22Z
publishDate 2017-10-01
publisher AIP Publishing LLC
record_format Article
series APL Materials
spelling doaj.art-af139663a86d413798658b3ba25c9f5c2022-12-21T18:43:24ZengAIP Publishing LLCAPL Materials2166-532X2017-10-01510106106106106-610.1063/1.5001876005710APMPorous single crystalline 4H silicon carbide rugate mirrorsMarkus Leitgeb0Christopher Zellner1Michael Schneider2Ulrich Schmid3Institute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaInstitute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaInstitute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaInstitute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaPorous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge. The resulting degree of porosity as well as the refractive index profile could be estimated with image processing, thus enabling the prediction of the peak position in the reflection spectrum of the mirrors. Furthermore the presented method allows the re-use of the 4H–SiC bulk sample for subsequent mirror fabrication.http://dx.doi.org/10.1063/1.5001876
spellingShingle Markus Leitgeb
Christopher Zellner
Michael Schneider
Ulrich Schmid
Porous single crystalline 4H silicon carbide rugate mirrors
APL Materials
title Porous single crystalline 4H silicon carbide rugate mirrors
title_full Porous single crystalline 4H silicon carbide rugate mirrors
title_fullStr Porous single crystalline 4H silicon carbide rugate mirrors
title_full_unstemmed Porous single crystalline 4H silicon carbide rugate mirrors
title_short Porous single crystalline 4H silicon carbide rugate mirrors
title_sort porous single crystalline 4h silicon carbide rugate mirrors
url http://dx.doi.org/10.1063/1.5001876
work_keys_str_mv AT markusleitgeb poroussinglecrystalline4hsiliconcarbiderugatemirrors
AT christopherzellner poroussinglecrystalline4hsiliconcarbiderugatemirrors
AT michaelschneider poroussinglecrystalline4hsiliconcarbiderugatemirrors
AT ulrichschmid poroussinglecrystalline4hsiliconcarbiderugatemirrors