Porous single crystalline 4H silicon carbide rugate mirrors
Porous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge....
Main Authors: | , , , |
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Format: | Article |
Language: | English |
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AIP Publishing LLC
2017-10-01
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Series: | APL Materials |
Online Access: | http://dx.doi.org/10.1063/1.5001876 |
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author | Markus Leitgeb Christopher Zellner Michael Schneider Ulrich Schmid |
author_facet | Markus Leitgeb Christopher Zellner Michael Schneider Ulrich Schmid |
author_sort | Markus Leitgeb |
collection | DOAJ |
description | Porous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge. The resulting degree of porosity as well as the refractive index profile could be estimated with image processing, thus enabling the prediction of the peak position in the reflection spectrum of the mirrors. Furthermore the presented method allows the re-use of the 4H–SiC bulk sample for subsequent mirror fabrication. |
first_indexed | 2024-12-22T01:35:22Z |
format | Article |
id | doaj.art-af139663a86d413798658b3ba25c9f5c |
institution | Directory Open Access Journal |
issn | 2166-532X |
language | English |
last_indexed | 2024-12-22T01:35:22Z |
publishDate | 2017-10-01 |
publisher | AIP Publishing LLC |
record_format | Article |
series | APL Materials |
spelling | doaj.art-af139663a86d413798658b3ba25c9f5c2022-12-21T18:43:24ZengAIP Publishing LLCAPL Materials2166-532X2017-10-01510106106106106-610.1063/1.5001876005710APMPorous single crystalline 4H silicon carbide rugate mirrorsMarkus Leitgeb0Christopher Zellner1Michael Schneider2Ulrich Schmid3Institute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaInstitute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaInstitute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaInstitute of Sensor and Actuator Systems, TU Wien, Gusshausstrasse 25-27, 1040 Vienna, AustriaPorous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge. The resulting degree of porosity as well as the refractive index profile could be estimated with image processing, thus enabling the prediction of the peak position in the reflection spectrum of the mirrors. Furthermore the presented method allows the re-use of the 4H–SiC bulk sample for subsequent mirror fabrication.http://dx.doi.org/10.1063/1.5001876 |
spellingShingle | Markus Leitgeb Christopher Zellner Michael Schneider Ulrich Schmid Porous single crystalline 4H silicon carbide rugate mirrors APL Materials |
title | Porous single crystalline 4H silicon carbide rugate mirrors |
title_full | Porous single crystalline 4H silicon carbide rugate mirrors |
title_fullStr | Porous single crystalline 4H silicon carbide rugate mirrors |
title_full_unstemmed | Porous single crystalline 4H silicon carbide rugate mirrors |
title_short | Porous single crystalline 4H silicon carbide rugate mirrors |
title_sort | porous single crystalline 4h silicon carbide rugate mirrors |
url | http://dx.doi.org/10.1063/1.5001876 |
work_keys_str_mv | AT markusleitgeb poroussinglecrystalline4hsiliconcarbiderugatemirrors AT christopherzellner poroussinglecrystalline4hsiliconcarbiderugatemirrors AT michaelschneider poroussinglecrystalline4hsiliconcarbiderugatemirrors AT ulrichschmid poroussinglecrystalline4hsiliconcarbiderugatemirrors |