Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts
This paper describes a rapid bottom-up approach to selectively functionalize gold nanoparticles (AuNPs) on an indium tin oxide (ITO) substrate using the plasmon confinement effect. The plasmonic substrates based on a AuNP-free surfactant were fabricated by electrochemical deposition. Using this bott...
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2021-07-01
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author | Luong-Lam Nguyen Quang-Hai Le Van-Nhat Pham Mathieu Bastide Sarra Gam-Derouich Van-Quynh Nguyen Jean-Christophe Lacroix |
author_facet | Luong-Lam Nguyen Quang-Hai Le Van-Nhat Pham Mathieu Bastide Sarra Gam-Derouich Van-Quynh Nguyen Jean-Christophe Lacroix |
author_sort | Luong-Lam Nguyen |
collection | DOAJ |
description | This paper describes a rapid bottom-up approach to selectively functionalize gold nanoparticles (AuNPs) on an indium tin oxide (ITO) substrate using the plasmon confinement effect. The plasmonic substrates based on a AuNP-free surfactant were fabricated by electrochemical deposition. Using this bottom-up technique, many sub-30 nm spatial gaps between the deposited AuNPs were randomly generated on the ITO substrate, which is difficult to obtain with a top-down approach (i.e., E-beam lithography) due to its fabrication limits. The 4-Aminodiphenyl (ADP) molecules were grafted directly onto the AuNPs through a plasmon-induced reduction of the 4-Aminodiphenyl diazonium salts (ADPD). The ADP organic layer preferentially grew in the narrow gaps between the many adjacent AuNPs to create interconnected AuNPs. This novel strategy opens up an efficient technique for the localized surface modification at the nanoscale over a macroscopic area, which is anticipated to be an advanced nanofabrication technique. |
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spelling | doaj.art-af1e011b97bf4b8aa9c494edb1c6447f2023-11-22T08:58:20ZengMDPI AGNanomaterials2079-49912021-07-01118195710.3390/nano11081957Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium SaltsLuong-Lam Nguyen0Quang-Hai Le1Van-Nhat Pham2Mathieu Bastide3Sarra Gam-Derouich4Van-Quynh Nguyen5Jean-Christophe Lacroix6Department of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, VietnamDepartment of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, VietnamDepartment of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, VietnamChemistry Department, Université de Paris, ITODYS, UMR 7086 CNRS, 15 Rue Jean-Antoine de Baïf, CEDEX 13, 75205 Paris, FranceChemistry Department, Université de Paris, ITODYS, UMR 7086 CNRS, 15 Rue Jean-Antoine de Baïf, CEDEX 13, 75205 Paris, FranceDepartment of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, VietnamDepartment of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, VietnamThis paper describes a rapid bottom-up approach to selectively functionalize gold nanoparticles (AuNPs) on an indium tin oxide (ITO) substrate using the plasmon confinement effect. The plasmonic substrates based on a AuNP-free surfactant were fabricated by electrochemical deposition. Using this bottom-up technique, many sub-30 nm spatial gaps between the deposited AuNPs were randomly generated on the ITO substrate, which is difficult to obtain with a top-down approach (i.e., E-beam lithography) due to its fabrication limits. The 4-Aminodiphenyl (ADP) molecules were grafted directly onto the AuNPs through a plasmon-induced reduction of the 4-Aminodiphenyl diazonium salts (ADPD). The ADP organic layer preferentially grew in the narrow gaps between the many adjacent AuNPs to create interconnected AuNPs. This novel strategy opens up an efficient technique for the localized surface modification at the nanoscale over a macroscopic area, which is anticipated to be an advanced nanofabrication technique.https://www.mdpi.com/2079-4991/11/8/1957interconnected gold nanoparticlesplasmonic electrochemistrydiazonium reductionnanofabricationhot electrons |
spellingShingle | Luong-Lam Nguyen Quang-Hai Le Van-Nhat Pham Mathieu Bastide Sarra Gam-Derouich Van-Quynh Nguyen Jean-Christophe Lacroix Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts Nanomaterials interconnected gold nanoparticles plasmonic electrochemistry diazonium reduction nanofabrication hot electrons |
title | Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts |
title_full | Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts |
title_fullStr | Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts |
title_full_unstemmed | Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts |
title_short | Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts |
title_sort | confinement effect of plasmon for the fabrication of interconnected aunps through the reduction of diazonium salts |
topic | interconnected gold nanoparticles plasmonic electrochemistry diazonium reduction nanofabrication hot electrons |
url | https://www.mdpi.com/2079-4991/11/8/1957 |
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