Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material

Abstract The crystallization of amorphous Ge2Sb2Te5 phase change material induced by electron beam irradiation was investigated by in-situ transmission electron microscopy (TEM). Amorphous matrix transformed into a partially crystalline state after being irradiated with a 200-keV electron beam for a...

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Main Author: Byeong-Seon An
Format: Article
Language:English
Published: SpringerOpen 2019-12-01
Series:Applied Microscopy
Subjects:
Online Access:https://doi.org/10.1186/s42649-019-0021-5
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author Byeong-Seon An
author_facet Byeong-Seon An
author_sort Byeong-Seon An
collection DOAJ
description Abstract The crystallization of amorphous Ge2Sb2Te5 phase change material induced by electron beam irradiation was investigated by in-situ transmission electron microscopy (TEM). Amorphous matrix transformed into a partially crystalline state after being irradiated with a 200-keV electron beam for a long time. Real-time observation revealed that the crystallization of amorphous Ge2Sb2Te5 film occurs through a nucleation and growth mechanism under electron beam irradiation in TEM. While uncertainty from the 2D projection remains, the nuclei have been observed to grow preferentially along the < 100> direction.
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spelling doaj.art-af3e38c525b246e8824072bfe5f055ae2022-12-21T19:00:51ZengSpringerOpenApplied Microscopy2287-44452019-12-014911210.1186/s42649-019-0021-5Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide materialByeong-Seon An0School of Advanced Materials Science & Engineering, Sungkyunkwan UniversityAbstract The crystallization of amorphous Ge2Sb2Te5 phase change material induced by electron beam irradiation was investigated by in-situ transmission electron microscopy (TEM). Amorphous matrix transformed into a partially crystalline state after being irradiated with a 200-keV electron beam for a long time. Real-time observation revealed that the crystallization of amorphous Ge2Sb2Te5 film occurs through a nucleation and growth mechanism under electron beam irradiation in TEM. While uncertainty from the 2D projection remains, the nuclei have been observed to grow preferentially along the < 100> direction.https://doi.org/10.1186/s42649-019-0021-5Ge-Sb-Te based chalcogenideTransmission electron microscopyElectron beam irradiationCrystallization
spellingShingle Byeong-Seon An
Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material
Applied Microscopy
Ge-Sb-Te based chalcogenide
Transmission electron microscopy
Electron beam irradiation
Crystallization
title Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material
title_full Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material
title_fullStr Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material
title_full_unstemmed Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material
title_short Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material
title_sort electron beam irradiation induced crystallization behavior of amorphous ge2sb2te5 chalcogenide material
topic Ge-Sb-Te based chalcogenide
Transmission electron microscopy
Electron beam irradiation
Crystallization
url https://doi.org/10.1186/s42649-019-0021-5
work_keys_str_mv AT byeongseonan electronbeamirradiationinducedcrystallizationbehaviorofamorphousge2sb2te5chalcogenidematerial