Plasma Assisted Reduction of Graphene Oxide Films
The past decade has seen enormous efforts in the investigation and development of reduced graphene oxide (GO) and its applications. Reduced graphene oxide (rGO) derived from GO is known to have relatively inferior electronic characteristics when compared to pristine graphene. Yet, it has its signifi...
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-02-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/11/2/382 |
| _version_ | 1797416165237063680 |
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| author | Sri Hari Bharath Vinoth Kumar Ruslan Muydinov Bernd Szyszka |
| author_facet | Sri Hari Bharath Vinoth Kumar Ruslan Muydinov Bernd Szyszka |
| author_sort | Sri Hari Bharath Vinoth Kumar |
| collection | DOAJ |
| description | The past decade has seen enormous efforts in the investigation and development of reduced graphene oxide (GO) and its applications. Reduced graphene oxide (rGO) derived from GO is known to have relatively inferior electronic characteristics when compared to pristine graphene. Yet, it has its significance attributed to high-yield production from inexpensive graphite, ease of fabrication with solution processing, and thus a high potential for large-scale applications and commercialization. Amongst several available approaches for GO reduction, the mature use of plasma technologies is noteworthy. Plasma technologies credited with unique merits are well established in the field of nanotechnology and find applications across several fields. The use of plasma techniques for GO development could speed up the pathway to commercialization. In this report, we review the state-of-the-art status of plasma techniques used for the reduction of GO-films. The strength of various techniques is highlighted with a summary of the main findings in the literature. An analysis is included through the prism of chemistry and plasma physics. |
| first_indexed | 2024-03-09T05:59:20Z |
| format | Article |
| id | doaj.art-b0bc09a91612428097d4930713c37618 |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-09T05:59:20Z |
| publishDate | 2021-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-b0bc09a91612428097d4930713c376182023-12-03T12:10:53ZengMDPI AGNanomaterials2079-49912021-02-0111238210.3390/nano11020382Plasma Assisted Reduction of Graphene Oxide FilmsSri Hari Bharath Vinoth Kumar0Ruslan Muydinov1Bernd Szyszka2Institute of High-Frequency and Semiconductor System Technologies, Technische Universität Berlin, HFT 5-2, Einsteinufer 25, 10587 Berlin, GermanyInstitute of High-Frequency and Semiconductor System Technologies, Technische Universität Berlin, HFT 5-2, Einsteinufer 25, 10587 Berlin, GermanyInstitute of High-Frequency and Semiconductor System Technologies, Technische Universität Berlin, HFT 5-2, Einsteinufer 25, 10587 Berlin, GermanyThe past decade has seen enormous efforts in the investigation and development of reduced graphene oxide (GO) and its applications. Reduced graphene oxide (rGO) derived from GO is known to have relatively inferior electronic characteristics when compared to pristine graphene. Yet, it has its significance attributed to high-yield production from inexpensive graphite, ease of fabrication with solution processing, and thus a high potential for large-scale applications and commercialization. Amongst several available approaches for GO reduction, the mature use of plasma technologies is noteworthy. Plasma technologies credited with unique merits are well established in the field of nanotechnology and find applications across several fields. The use of plasma techniques for GO development could speed up the pathway to commercialization. In this report, we review the state-of-the-art status of plasma techniques used for the reduction of GO-films. The strength of various techniques is highlighted with a summary of the main findings in the literature. An analysis is included through the prism of chemistry and plasma physics.https://www.mdpi.com/2079-4991/11/2/382graphene oxideplasma treatmentreduction |
| spellingShingle | Sri Hari Bharath Vinoth Kumar Ruslan Muydinov Bernd Szyszka Plasma Assisted Reduction of Graphene Oxide Films Nanomaterials graphene oxide plasma treatment reduction |
| title | Plasma Assisted Reduction of Graphene Oxide Films |
| title_full | Plasma Assisted Reduction of Graphene Oxide Films |
| title_fullStr | Plasma Assisted Reduction of Graphene Oxide Films |
| title_full_unstemmed | Plasma Assisted Reduction of Graphene Oxide Films |
| title_short | Plasma Assisted Reduction of Graphene Oxide Films |
| title_sort | plasma assisted reduction of graphene oxide films |
| topic | graphene oxide plasma treatment reduction |
| url | https://www.mdpi.com/2079-4991/11/2/382 |
| work_keys_str_mv | AT sriharibharathvinothkumar plasmaassistedreductionofgrapheneoxidefilms AT ruslanmuydinov plasmaassistedreductionofgrapheneoxidefilms AT berndszyszka plasmaassistedreductionofgrapheneoxidefilms |