Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM
Scanning- and colloidal-probe atomic force microscopy were used to study the mechanical properties of poly(L-lysine)/hyaluronan (PLL/HA)n films as a function of indentation velocity and the number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods:...
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| Format: | Article |
| Language: | English |
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Beilstein-Institut
2012-11-01
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| Series: | Beilstein Journal of Nanotechnology |
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| Online Access: | https://doi.org/10.3762/bjnano.3.87 |
| _version_ | 1818300613992120320 |
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| author | Cagri Üzüm Johannes Hellwig Narayanan Madaboosi Dmitry Volodkin Regine von Klitzing |
| author_facet | Cagri Üzüm Johannes Hellwig Narayanan Madaboosi Dmitry Volodkin Regine von Klitzing |
| author_sort | Cagri Üzüm |
| collection | DOAJ |
| description | Scanning- and colloidal-probe atomic force microscopy were used to study the mechanical properties of poly(L-lysine)/hyaluronan (PLL/HA)n films as a function of indentation velocity and the number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods: scratch-and-scan and newly developed full-indentation. The advantages and disadvantages of both methods are highlighted, and error minimization techniques in elasticity measurements are addressed. It was found that the film thickness increases linearly with the bilayer number n, ranging between 400 and 7500 nm for n = 12 and 96, respectively. The apparent Young’s modulus E ranges between 15 and 40 kPa and does not depend on the indenter size or the film bilayer number n. Stress relaxation measurements show that PLL/HA films have a viscoelastic behaviour, regardless of their thickness. If indentation is performed several times at the same lateral position on the film, a viscous/plastic deformation takes place. |
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| id | doaj.art-b0d423a99390430992d50fdcb5e5773f |
| institution | Directory Open Access Journal |
| issn | 2190-4286 |
| language | English |
| last_indexed | 2024-12-13T05:09:55Z |
| publishDate | 2012-11-01 |
| publisher | Beilstein-Institut |
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| series | Beilstein Journal of Nanotechnology |
| spelling | doaj.art-b0d423a99390430992d50fdcb5e5773f2022-12-21T23:58:34ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862012-11-013177878810.3762/bjnano.3.872190-4286-3-87Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFMCagri Üzüm0Johannes Hellwig1Narayanan Madaboosi2Dmitry Volodkin3Regine von Klitzing4Stranski-Laboratorium, Department of Chemistry, TU Berlin, Strasse des 17. Juni 124, D-10623 Berlin, GermanyStranski-Laboratorium, Department of Chemistry, TU Berlin, Strasse des 17. Juni 124, D-10623 Berlin, GermanyFraunhofer Institute for Biomedical Engineering, Am Mühlenberg 13, 14476 Potsdam-Golm, GermanyStranski-Laboratorium, Department of Chemistry, TU Berlin, Strasse des 17. Juni 124, D-10623 Berlin, GermanyStranski-Laboratorium, Department of Chemistry, TU Berlin, Strasse des 17. Juni 124, D-10623 Berlin, GermanyScanning- and colloidal-probe atomic force microscopy were used to study the mechanical properties of poly(L-lysine)/hyaluronan (PLL/HA)n films as a function of indentation velocity and the number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods: scratch-and-scan and newly developed full-indentation. The advantages and disadvantages of both methods are highlighted, and error minimization techniques in elasticity measurements are addressed. It was found that the film thickness increases linearly with the bilayer number n, ranging between 400 and 7500 nm for n = 12 and 96, respectively. The apparent Young’s modulus E ranges between 15 and 40 kPa and does not depend on the indenter size or the film bilayer number n. Stress relaxation measurements show that PLL/HA films have a viscoelastic behaviour, regardless of their thickness. If indentation is performed several times at the same lateral position on the film, a viscous/plastic deformation takes place.https://doi.org/10.3762/bjnano.3.87atomic force microscopypolyelectrolyte multilayersstress relaxationviscoelasticityYoung’s modulus |
| spellingShingle | Cagri Üzüm Johannes Hellwig Narayanan Madaboosi Dmitry Volodkin Regine von Klitzing Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM Beilstein Journal of Nanotechnology atomic force microscopy polyelectrolyte multilayers stress relaxation viscoelasticity Young’s modulus |
| title | Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM |
| title_full | Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM |
| title_fullStr | Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM |
| title_full_unstemmed | Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM |
| title_short | Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM |
| title_sort | growth behaviour and mechanical properties of pll ha multilayer films studied by afm |
| topic | atomic force microscopy polyelectrolyte multilayers stress relaxation viscoelasticity Young’s modulus |
| url | https://doi.org/10.3762/bjnano.3.87 |
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