Influence of argon/nitrogen sputtering gas and molybdenum/titanium seed layer on aluminium nitride ⟨100⟩ thin film growth using ceramic target

Influence of argon/nitrogen sputtering gas and molybdenum/titanium seed layer on aluminium nitride ⟨100⟩ thin film growth using ceramic target

Aluminium nitride (AlN) can be sputter-deposited onto a substrate to form polycrystalline or single crystal AlN thin film layer. Highly crystalline AlN in ⟨100⟩ orientation has found its application in high-frequency acoustic wave resonators. The research work to investigate AlN ⟨100⟩ crystal growth...

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Bibliographic Details
Main Authors: Muhammad Izzuddin Abd Samad, Syazwani Izrah Badrudin, Darven Raj Ponnuthurai, Marwan Mansor, Nafarizal Nayan, Ahmad Shuhaimi Abu Bakar, Rhonira Latif
Format: Article
Language:English
Published: Elsevier 2024-03-01
Series:Journal of Materials Research and Technology
Subjects:
Surface morphology
AlN target
Crystal growth
Molecular bonding
a-plane
c-plane
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785424002850

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