Efficient Rigorous Coupled-Wave Analysis Simulation of Mueller Matrix Ellipsometry of Three-Dimensional Multilayer Nanostructures

Efficient Rigorous Coupled-Wave Analysis Simulation of Mueller Matrix Ellipsometry of Three-Dimensional Multilayer Nanostructures

Mueller matrix ellipsometry (MME) is a powerful metrology tool for nanomanufacturing. The application of MME necessitates electromagnetic computations for inverse problems of metrology determination in both the conventional optimization process and the recent neutral network approach. In this study,...

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Bibliographic Details
Main Authors: Hoang-Lam Pham, Thomas Alcaire, Sebastien Soulan, Delphine Le Cunff, Jean-Hervé Tortai
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Nanomaterials
Subjects:
Mueller matrix ellipsometry
RCWA
3D multilayer nanostructures
scattering matrix
Online Access:https://www.mdpi.com/2079-4991/12/22/3951

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