Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope
Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diame...
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| Format: | Article |
| Language: | English |
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MDPI AG
2019-10-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/9/10/1452 |
| _version_ | 1818610889705652224 |
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| author | Agata Roszkiewicz Amrita Jain Marian Teodorczyk Wojciech Nasalski |
| author_facet | Agata Roszkiewicz Amrita Jain Marian Teodorczyk Wojciech Nasalski |
| author_sort | Agata Roszkiewicz |
| collection | DOAJ |
| description | Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diameter, is used as a light source. As a result, after optimization of parameters like laser power, exposure time, or sleep time, it is confirmed that it is possible to obtain a uniform nanopattern structure in the photoresist layer. In addition, the lines of holes are characterized by a uniform depth (71−87 nm) and relatively high aspect ratio ranging from 0.22 to 0.26. Numerical modelling performed with a rigorous method shows that such a structure can be potentially used as a phase zone plate. |
| first_indexed | 2024-12-16T15:21:37Z |
| format | Article |
| id | doaj.art-b2149f699e0041589eaf3ba6d40eafe6 |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-12-16T15:21:37Z |
| publishDate | 2019-10-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-b2149f699e0041589eaf3ba6d40eafe62022-12-21T22:26:37ZengMDPI AGNanomaterials2079-49912019-10-01910145210.3390/nano9101452nano9101452Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical MicroscopeAgata Roszkiewicz0Amrita Jain1Marian Teodorczyk2Wojciech Nasalski3Institute of Fundamental Technological Research, Polish Academy of Sciences (IPPT PAN), Adolfa Pawińskiego 5b, 02-106 Warsaw, PolandInstitute of Fundamental Technological Research, Polish Academy of Sciences (IPPT PAN), Adolfa Pawińskiego 5b, 02-106 Warsaw, PolandInstitute of Electronic Materials Technology (ITME), Wólczyńska 133, 01-919 Warsaw, PolandInstitute of Fundamental Technological Research, Polish Academy of Sciences (IPPT PAN), Adolfa Pawińskiego 5b, 02-106 Warsaw, PolandPatterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diameter, is used as a light source. As a result, after optimization of parameters like laser power, exposure time, or sleep time, it is confirmed that it is possible to obtain a uniform nanopattern structure in the photoresist layer. In addition, the lines of holes are characterized by a uniform depth (71−87 nm) and relatively high aspect ratio ranging from 0.22 to 0.26. Numerical modelling performed with a rigorous method shows that such a structure can be potentially used as a phase zone plate.https://www.mdpi.com/2079-4991/9/10/1452optical lithographyphotoresistquartzhole nanopatterning |
| spellingShingle | Agata Roszkiewicz Amrita Jain Marian Teodorczyk Wojciech Nasalski Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope Nanomaterials optical lithography photoresist quartz hole nanopatterning |
| title | Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope |
| title_full | Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope |
| title_fullStr | Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope |
| title_full_unstemmed | Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope |
| title_short | Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope |
| title_sort | formation and characterization of hole nanopattern on photoresist layer by scanning near field optical microscope |
| topic | optical lithography photoresist quartz hole nanopatterning |
| url | https://www.mdpi.com/2079-4991/9/10/1452 |
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