Breakthroughs in Photonics 2013: X-Ray Optics
This review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounti...
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| Format: | Article |
| Language: | English |
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IEEE
2014-01-01
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| Series: | IEEE Photonics Journal |
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| Online Access: | https://ieeexplore.ieee.org/document/6807862/ |
| _version_ | 1818457997354991616 |
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| author | Regina Soufli |
| author_facet | Regina Soufli |
| author_sort | Regina Soufli |
| collection | DOAJ |
| description | This review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounting technologies for large-area optical substrates with improved figure, roughness, and focusing properties; ii) multilayer coatings with especially optimized layer properties, achieving improved reflectance, stability, and out-of-band suppression; and iii) nanodiffractive optics with improved efficiency and resolution. |
| first_indexed | 2024-12-14T22:51:27Z |
| format | Article |
| id | doaj.art-b307811a194447168c44192b50011105 |
| institution | Directory Open Access Journal |
| issn | 1943-0655 |
| language | English |
| last_indexed | 2024-12-14T22:51:27Z |
| publishDate | 2014-01-01 |
| publisher | IEEE |
| record_format | Article |
| series | IEEE Photonics Journal |
| spelling | doaj.art-b307811a194447168c44192b500111052022-12-21T22:44:42ZengIEEEIEEE Photonics Journal1943-06552014-01-01621610.1109/JPHOT.2014.23096406807862Breakthroughs in Photonics 2013: X-Ray OpticsRegina Soufli0Lawrence Livermore National Laboratory, Livermore, CA, USAThis review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounting technologies for large-area optical substrates with improved figure, roughness, and focusing properties; ii) multilayer coatings with especially optimized layer properties, achieving improved reflectance, stability, and out-of-band suppression; and iii) nanodiffractive optics with improved efficiency and resolution.https://ieeexplore.ieee.org/document/6807862/X-ray opticsmultilayer interference coatingsmetrologyEUVX-ray applications |
| spellingShingle | Regina Soufli Breakthroughs in Photonics 2013: X-Ray Optics IEEE Photonics Journal X-ray optics multilayer interference coatings metrology EUV X-ray applications |
| title | Breakthroughs in Photonics 2013: X-Ray Optics |
| title_full | Breakthroughs in Photonics 2013: X-Ray Optics |
| title_fullStr | Breakthroughs in Photonics 2013: X-Ray Optics |
| title_full_unstemmed | Breakthroughs in Photonics 2013: X-Ray Optics |
| title_short | Breakthroughs in Photonics 2013: X-Ray Optics |
| title_sort | breakthroughs in photonics 2013 x ray optics |
| topic | X-ray optics multilayer interference coatings metrology EUV X-ray applications |
| url | https://ieeexplore.ieee.org/document/6807862/ |
| work_keys_str_mv | AT reginasoufli breakthroughsinphotonics2013xrayoptics |