The Use of Ion Milling for Surface Preparation for EBSD Analysis
An electron backscattered diffraction (EBSD) method provides information about the crystallographic structure of materials. However, a surface subjected to analysis needs to be well-prepared. This usually requires following a time-consuming procedure of mechanical polishing. The alternative methods...
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-07-01
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| Series: | Materials |
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| Online Access: | https://www.mdpi.com/1996-1944/14/14/3970 |
| _version_ | 1797526672100032512 |
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| author | Wojciech J. Nowak |
| author_facet | Wojciech J. Nowak |
| author_sort | Wojciech J. Nowak |
| collection | DOAJ |
| description | An electron backscattered diffraction (EBSD) method provides information about the crystallographic structure of materials. However, a surface subjected to analysis needs to be well-prepared. This usually requires following a time-consuming procedure of mechanical polishing. The alternative methods of surface preparation for EBSD are performed via electropolishing or focus ion beam (FIB). In the present study, plasma etching using a glow discharge optical emission spectrometer (GD-OES) was applied for surface preparation for EBSD analysis. The obtained results revealed that plasma etching through GD-OES can be successfully used for surface preparation for EBSD analysis. However, it was also found that the plasma etching is sensitive for the alloy microstructure, i.e., the presence of intermetallic phases and precipitates such as carbides possess a different sputtering rate, resulting in non-uniform plasma etching. Preparation of the cross-section of oxidized CM247 revealed a similar problem with non-uniformity of plasma etching. The carbides and oxide scale possess a lower sputtering rate than the metallic matrix, which caused formation of relief. Based on obtained results, possible resolutions to suppress the effect of different sputtering rates are proposed. |
| first_indexed | 2024-03-10T09:33:40Z |
| format | Article |
| id | doaj.art-b3a0043ef3a742158302ba1ca97fd9d5 |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-03-10T09:33:40Z |
| publishDate | 2021-07-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Materials |
| spelling | doaj.art-b3a0043ef3a742158302ba1ca97fd9d52023-11-22T04:17:41ZengMDPI AGMaterials1996-19442021-07-011414397010.3390/ma14143970The Use of Ion Milling for Surface Preparation for EBSD AnalysisWojciech J. Nowak0Department of Materials Science, Faculty of Mechanical Engineering and Aeronautics, Rzeszow University of Technology, al. Powstanców Warszawy 12, 35-959 Rzeszow, PolandAn electron backscattered diffraction (EBSD) method provides information about the crystallographic structure of materials. However, a surface subjected to analysis needs to be well-prepared. This usually requires following a time-consuming procedure of mechanical polishing. The alternative methods of surface preparation for EBSD are performed via electropolishing or focus ion beam (FIB). In the present study, plasma etching using a glow discharge optical emission spectrometer (GD-OES) was applied for surface preparation for EBSD analysis. The obtained results revealed that plasma etching through GD-OES can be successfully used for surface preparation for EBSD analysis. However, it was also found that the plasma etching is sensitive for the alloy microstructure, i.e., the presence of intermetallic phases and precipitates such as carbides possess a different sputtering rate, resulting in non-uniform plasma etching. Preparation of the cross-section of oxidized CM247 revealed a similar problem with non-uniformity of plasma etching. The carbides and oxide scale possess a lower sputtering rate than the metallic matrix, which caused formation of relief. Based on obtained results, possible resolutions to suppress the effect of different sputtering rates are proposed.https://www.mdpi.com/1996-1944/14/14/3970plasma etchingGD-OESEBSDalloy microstructure |
| spellingShingle | Wojciech J. Nowak The Use of Ion Milling for Surface Preparation for EBSD Analysis Materials plasma etching GD-OES EBSD alloy microstructure |
| title | The Use of Ion Milling for Surface Preparation for EBSD Analysis |
| title_full | The Use of Ion Milling for Surface Preparation for EBSD Analysis |
| title_fullStr | The Use of Ion Milling for Surface Preparation for EBSD Analysis |
| title_full_unstemmed | The Use of Ion Milling for Surface Preparation for EBSD Analysis |
| title_short | The Use of Ion Milling for Surface Preparation for EBSD Analysis |
| title_sort | use of ion milling for surface preparation for ebsd analysis |
| topic | plasma etching GD-OES EBSD alloy microstructure |
| url | https://www.mdpi.com/1996-1944/14/14/3970 |
| work_keys_str_mv | AT wojciechjnowak theuseofionmillingforsurfacepreparationforebsdanalysis AT wojciechjnowak useofionmillingforsurfacepreparationforebsdanalysis |