FORMATION OF LUMINESCENT NANOCRYSTALLINE SILICON FILMS FROM A-SI:H BY USING RAPID THERMAL ANNEALING AND WET CHEMICAL ETCHING
Nanocrystalline silicon films, which exhibit efficient photoluminescence, were formed from amorphous films of hydrogenated silicon subjected to rapid thermal annealing and stain etching in hydrofluoric acid based solutions. The samples were investigated by means of scanning and transmission electron...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Al-Farabi Kazakh National University
2009-12-01
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| Series: | Вестник. Серия физическая |
| Online Access: | https://bph.kaznu.kz/index.php/zhuzhu/article/view/228 |
| Summary: | Nanocrystalline silicon films, which exhibit efficient photoluminescence, were formed from amorphous films of hydrogenated silicon subjected to rapid thermal annealing and stain etching in hydrofluoric acid based solutions. The samples were investigated by means of scanning and transmission electron microscopy, optical spectroscopy of reflection, Raman scattering and photoluminescence methods, which revealed the nanocrystalline structure and excellent optical quality of the formed nc-Si films. |
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| ISSN: | 1563-0315 2663-2276 |