3D Patterning of Si by Contact Etching With Nanoporous Metals

3D Patterning of Si by Contact Etching With Nanoporous Metals

Nanoporous gold and platinum electrodes are used to pattern n-type silicon by contact etching at the macroscopic scale. This type of electrode has the advantage of forming nanocontacts between silicon, the metal and the electrolyte as in classical metal assisted chemical etching while ensuring elect...

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Bibliographic Details
Main Authors: Stéphane Bastide, Encarnacion Torralba, Mathieu Halbwax, Sylvain Le Gall, Elias Mpogui, Christine Cachet-Vivier, Vincent Magnin, Joseph Harari, Dmitri Yarekha, Jean-Pierre Vilcot
Format: Article
Language:English
Published: Frontiers Media S.A. 2019-04-01
Series:Frontiers in Chemistry
Subjects:
silicon
nanoporous gold
imprinting
MACE
contact etching
patterning
Online Access:https://www.frontiersin.org/article/10.3389/fchem.2019.00256/full

Internet

https://www.frontiersin.org/article/10.3389/fchem.2019.00256/full

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