Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide
Assessment is performed of the permissible nonuniformity of irradiation and temperature scatter as per the wafer area during the rapid thermal treatment, not causing the thermal stresses in it, resultant in the plastic melting or silicon disruption. It was shown, that formation of platinum silicide...
| Main Authors: | , , |
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| Format: | Article |
| Language: | Russian |
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Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Subjects: | |
| Online Access: | https://doklady.bsuir.by/jour/article/view/1137 |
| _version_ | 1797881033405759488 |
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| author | V. A. Solodukha V. A. Pilipenko V. A. Gorushko |
| author_facet | V. A. Solodukha V. A. Pilipenko V. A. Gorushko |
| author_sort | V. A. Solodukha |
| collection | DOAJ |
| description | Assessment is performed of the permissible nonuniformity of irradiation and temperature scatter as per the wafer area during the rapid thermal treatment, not causing the thermal stresses in it, resultant in the plastic melting or silicon disruption. It was shown, that formation of platinum silicide at Т≤ 810 °С does not cause the negative phenomena in silicon, and it should be performed in the nitrogen environment, whose flooding into the the sealed chamber is done after creation in it of vacuum of 10 –2 mm, mercury column. |
| first_indexed | 2024-04-10T03:12:37Z |
| format | Article |
| id | doaj.art-b434c8bce7c447e4a99cd5f47cdd9597 |
| institution | Directory Open Access Journal |
| issn | 1729-7648 |
| language | Russian |
| last_indexed | 2024-04-10T03:12:37Z |
| publishDate | 2019-06-01 |
| publisher | Educational institution «Belarusian State University of Informatics and Radioelectronics» |
| record_format | Article |
| series | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| spelling | doaj.art-b434c8bce7c447e4a99cd5f47cdd95972023-03-13T07:33:19ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-010888921136Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicideV. A. Solodukha0V. A. Pilipenko1V. A. Gorushko2JSC «INTEGRAL» – holding managing company «INTEGRAL»JSC «INTEGRAL» – holding managing company «INTEGRAL»JSC «INTEGRAL» – holding managing company «INTEGRAL»Assessment is performed of the permissible nonuniformity of irradiation and temperature scatter as per the wafer area during the rapid thermal treatment, not causing the thermal stresses in it, resultant in the plastic melting or silicon disruption. It was shown, that formation of platinum silicide at Т≤ 810 °С does not cause the negative phenomena in silicon, and it should be performed in the nitrogen environment, whose flooding into the the sealed chamber is done after creation in it of vacuum of 10 –2 mm, mercury column.https://doklady.bsuir.by/jour/article/view/1137intergrated circuitrapid thermal treatmentplatinum silicidethermal stresses |
| spellingShingle | V. A. Solodukha V. A. Pilipenko V. A. Gorushko Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki intergrated circuit rapid thermal treatment platinum silicide thermal stresses |
| title | Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide |
| title_full | Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide |
| title_fullStr | Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide |
| title_full_unstemmed | Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide |
| title_short | Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide |
| title_sort | rapid thermal treatment modes of the рt si system for formation of platinum silicide |
| topic | intergrated circuit rapid thermal treatment platinum silicide thermal stresses |
| url | https://doklady.bsuir.by/jour/article/view/1137 |
| work_keys_str_mv | AT vasolodukha rapidthermaltreatmentmodesofthertsisystemforformationofplatinumsilicide AT vapilipenko rapidthermaltreatmentmodesofthertsisystemforformationofplatinumsilicide AT vagorushko rapidthermaltreatmentmodesofthertsisystemforformationofplatinumsilicide |