In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic

In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic

Abstract This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for...

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Bibliographic Details
Main Authors:	Tammy Chang, Saptarshi Mukherjee, Nicholas N. Watkins, David M. Stobbe, Owen Mays, Emer V. Baluyot, Andrew J. Pascall, Joseph W. Tringe
Format:	Article
Language:	English
Published:	Nature Portfolio 2020-12-01
Series:	Scientific Reports
Online Access:	https://doi.org/10.1038/s41598-020-79266-2

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